1335102-65-2

Upstream product

• 1335102-63-0 sodium 4-(3-(2-ethoxy-1,1-difluoro-2-oxoethoxy)adamantane-1-carbonyloxy)-1,1,2,2-tetrafluorobutane-1-sulfonate 
• 3353-89-7 triphenylsulfonium bromide 
• 1313214-09-3 sodium 1,1,2,2-tetrafluoro-4-(3-hydroxyadamantane-1-carbonyloxy)butane-1-sulfonate 
• 1335102-55-0 sodium 1,1,2,2-tetrafluoro-4-(3-methoxymethoxyadamantane-1-carbonyloxy)butane-1-sulfonate 
• 1335102-52-7 3-methoxymethoxyadamantane-1-carboxylic acid 
• 42711-75-1 3-hydroxyadamantane-1-carboxylic acid 

Relevant academic research and scientific papers

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT

A radiation-sensitive resin composition includes an acid generating agent to generate an organic acid by irradiation with a radioactive ray. The organic acid has a cyclic hydrocarbon group and an organic group including a bond that is cleavable by an acid or a base to produce a polar group. The organic acid is preferably represented by a following formula (I). Z represents an organic acid group. R2 represents an alkanediyl group, wherein a part or all of hydrogen atoms of the alkanediyl group represented by R1 are optionally substituted by a fluorine atom. X represents a single bond, O, OCO, COO, CO, SO3 or SO2. R2 represents a cyclic hydrocarbon group. R3 represents a monovalent organic group having a functional group represented by a following formula (x). n is an integer of 1 to 3. [in-line-formulae]Z—R1—X—R2—(R3)n ??(I)[/in-line-formulae] [in-line-formulae]—R31-G-R13 ??(x)[/in-line-formulae]