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Carbamic acid, cyclohexyl-, 1-(2-nitrophenyl)ethyl ester is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

133795-10-5

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133795-10-5 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 133795-10-5 includes 9 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 6 digits, 1,3,3,7,9 and 5 respectively; the second part has 2 digits, 1 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 133795-10:
(8*1)+(7*3)+(6*3)+(5*7)+(4*9)+(3*5)+(2*1)+(1*0)=135
135 % 10 = 5
So 133795-10-5 is a valid CAS Registry Number.

133795-10-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 18, 2017

Revision Date: Aug 18, 2017

1.Identification

1.1 GHS Product identifier

Product name 1-(2-nitrophenyl)ethyl N-cyclohexylcarbamate

1.2 Other means of identification

Product number -
Other names Carbamic acid,cyclohexyl-,1-(2-nitrophenyl)ethyl ester

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:133795-10-5 SDS

133795-10-5Relevant academic research and scientific papers

COMPOUND AND PHOTO-BASE GENERATOR COMPOSED OF THE COMPOUND

-

, (2018/06/01)

PROBLEM TO BE SOLVED: To provide a novel compound that functions as a photo-base generator that allows the curing reaction of an epoxy resin to quickly proceed. SOLUTION: The present invention provides a compound represented by formula (I) (R1-R6 independently represent H, a C1-C5 hydrocarbon group or a C1-C5 hydrocarbon oxy group ; R7 is a C1-C6 hydrocarbon group or C6-C15 aromatic ring; R8-R9 independently represent H or a C1-C15 hydrocarbon group; at least one of R8 and R9 represents the hydrocarbon group, and R8 and R9 may together form a ring structure). SELECTED DRAWING: None COPYRIGHT: (C)2018,JPOandINPIT

Photogeneration of Organic Bases from o-Nitrobenzyl-Derived Carbamates

Cameron, James F.,Fréchet, Jean M. J.

, p. 4303 - 4313 (2007/10/02)

The design of novel photoprecursors of organic bases and the steric and electronic factors that control their quantum-efficient transformation into free amines or diamines have been investigated. The basic design involves the protection of amines with photolabile [(o-nitrobenzyl)oxy]carbonyl groups or α-substituted analogues. The resulting protected amines owe their light sensitivity to the classical o-nitrobenzyl photorearrangement and cleanly liberate free amine in both the solid state and in solution upon irradiation with UV light below 400 nm. Several designs were explored in which the structure of the photoactive center was varied systematically to investigate the influence of various steric and electronic effects. In all cases, the practical potential of these photoactive carbamates as organic sources of photogenerated base was evaluated by product analysis of solution photolysates, by determination of their solid-state quantum efficiencies, and by measurement of their thermal properties. For example, the quantum efficiency of various carbamates for cyclohexylamine photogeneration at 254 nm ranged from 0.11 to 0.62 depending on both α-substituent and o-nitro substitution patterns, confirming the importance of both steric and electronic considerations. Similar results were obtained with other base photoprecursors and all showed good thermal stabilities.

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