134261-74-8Relevant articles and documents
PHOTORESIST MATERIALS BASED ON ORGANOMETALLIC-CONTAINING POLYSULFONES
Kim, Seong-Ju,Kim, Ji-Hong,Lee, Dae-Youp,Ko, Young-Hoon,Park, Byung-Sun,Park, Chun-Geun
, p. 317 - 324 (2007/10/02)
Soluble 1:1 alternating copolymers of p-tert-butylstyrene, p-(trimethylsilyl)styrene, p-(trimethylgermyl)styrene, and 3-vinylbenzyltrimethylsilane with sulfur dioxide have been synthesized by tert-butylhydroperoxide-initiated copolymerization at T -60 d