13463-71-3

Basic information

• Product Name: 3-hydroxy-2,2-dimethylpropyl methacrylate
• Synonyms: 3-hydroxy-2,2-dimethylpropyl methacrylate;Methacrylic acid 3-hydroxy-2,2-dimethylpropyl ester
• CAS NO: 13463-71-3
• Molecular Formula: C₉H₁₆O₃
• Molecular Weight: 172.22154
• EINECS: 236-676-0
• Mol File: 13463-71-3.mol
• Article Data: 5

Chemical Properties

• Boiling Point: 261.1°Cat760mmHg
• Flash Point: 104.1°C
• Appearance: /
• Density: 0.995g/cm³
• Vapor Pressure: 0.00169mmHg at 25°C
• Refractive Index: 1.45
• CAS DataBase Reference: 3-hydroxy-2,2-dimethylpropyl methacrylate(CAS DataBase Reference)
• NIST Chemistry Reference: 3-hydroxy-2,2-dimethylpropyl methacrylate(13463-71-3)
• EPA Substance Registry System: 3-hydroxy-2,2-dimethylpropyl methacrylate(13463-71-3)

Safety Data

• Hazardous Substances Data: 13463-71-3(Hazardous Substances Data)

Usage

InChI:InChI=1/C9H16O3/c1-7(2)8(11)12-6-9(3,4)5-10/h10H,1,5-6H2,2-4H3

Upstream product

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Relevant articles and documents

ACETOACETATE-FUNCTIONAL MONOMERS AND THEIR USES IN COATING COMPOSITIONS

Acetoacetate-functional monomers are disclosed that correspond to the following formula 1: in which R is hydrogen, or a methylgroup; X is a branched alkyl or a branched cyclic alkyl having from 5 to 8 carbon atoms; and Y1 and Y2 are independently hydrogen or methyl. Also disclosed are emulsion, suspension, and solution polymers comprising residues from the acetoacetate-functional monomer of formula 1 and one or more additional ethylenically unsaturated monomers. Self-curing coating compositions are likewise disclosed that comprise the acetoacetate-functional monomer of formula 1, and optionally one or more additional ethylenically unsaturated monomers. Latex formulations are also disclosed that comprise a polymer having residues from the acetoacetate-functional monomer of formula 1 dispersed in an evaporable aqueous carrier.

Hydroxyl-containing monomer, polymer, resist composition, and patterning process

A hydroxyl-containing monomer of formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are monovalent C1-C15 hydrocarbon groups, or R2 and R3 may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up to 500 nm and the effect of controlling acid diffusion so that the polymers may be used as a base resin to formulate radiation-sensitive resist compositions having a high resolution.

Process for preparing a polymerizable compound having both polymerizable double bond and hydroxyl group

A process for preparing a polymerizable compound of the formula: STR1 or a polymerizable compound of the formula: STR2 is provided. These formed compounds are useful for the preparation of an acrylic resin which is low in viscosity and capable of forming