1373359-69-3Relevant academic research and scientific papers
Resist composition and method of forming resist pattern
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Page/Page column, (2015/04/21)
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z1 represents a ring skeleton-containing hydrocarbon group, Q1 represents a divalent linking group containing oxygen, Y1 represents a fluorinated alkylene group, M+ represents an organic cation, R1 represents a fluorinated alkyl group or a hydrocarbon group, L1+ and L2+ represents a sulfonium or an iodonium, Z2 represents a hydrogen atom or a hydrocarbon group, Y2 represents a single bond or a divalent linking group containing no fluorine, R2 represents an organic group, Y3 represents an alkylene group or an arylene group; and Rf represents a fluorine-containing hydrocarbon group).
Method of manufacturing acylsulfonamide onium salt
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, (2016/12/26)
PROBLEM TO BE SOLVED: To solve a problem that a method for producing a sulfonamide onium salt from a sulfonamide through a sulfonamide alkali metal salt has a low yield of a sulfonamide onium salt and is not an industrial method for producing a sulfonamide onium salt.SOLUTION: The method for producing a sulfonamide alkali metal salt represented by general formula (2) (wherein Ris a ≥5C alicyclic group which may contain a substituent or a ≥2C group which may contain a substituent and contains a polymerizable unsaturated group at a terminal; X is a divalent linking group; Y is straight-chain, branched-chain or cyclic alkylene or arylene: Rf is a fluorine atom-containing hydrocarbon group; Mis an alkali metal ion) includes a first step of reacting a sulfonamide with an alkali metal hydroxide.
NOVEL COMPOUND
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Page/Page column 53, (2012/06/18)
A compound represented by general formula (c1) (R1 represents an alicyclic group of 5 or more carbon atoms which may have a substituent; X represents a divalent linking group; Y represents a linear, branched or cyclic alkylene group or an arylene group; Rf represents a hydrocarbon group containing a fluorine atom; and M+ represents an organic cation or a metal cation).
