14660-24-3 Usage
Uses
Used in Chemical Synthesis:
N,N-diethylsilanamine is used as an intermediate in the production of various organosilicon compounds, which are essential in the manufacturing of materials with unique properties such as high thermal stability, low surface energy, and excellent biocompatibility.
Used in Catalysts for Organic Synthesis:
As a catalyst, N,N-diethylsilanamine facilitates various organic reactions, enhancing the efficiency and selectivity of the synthesis processes. Its ability to accelerate reactions without being consumed makes it a valuable component in the production of pharmaceuticals, agrochemicals, and other specialty chemicals.
Used in Surface Modification and Adhesion Promotion:
In the production of polymers and inorganic materials, N,N-diethylsilanamine is used as a surface modifier and adhesion promoter. It enhances the compatibility between different materials, improving their adhesion and overall performance in various applications, such as coatings, adhesives, and composites.
Health and Safety Considerations:
N,N-diethylsilanamine is considered to be moderately hazardous, with potential health effects including skin and eye irritation, and respiratory and central nervous system depression. Therefore, it should be handled with care and proper protective equipment to ensure the safety of workers and the environment.
Check Digit Verification of cas no
The CAS Registry Mumber 14660-24-3 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,4,6,6 and 0 respectively; the second part has 2 digits, 2 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 14660-24:
(7*1)+(6*4)+(5*6)+(4*6)+(3*0)+(2*2)+(1*4)=93
93 % 10 = 3
So 14660-24-3 is a valid CAS Registry Number.
14660-24-3Relevant academic research and scientific papers
Differences in Reactivity of 1,4-Disilabutane and n-Tetrasilane towards Secondary Amines
Schmidbaur, Hubert,Schuh, Heinz
, p. 1679 - 1683 (2007/10/02)
1,4-Disilabutane H3SiCH2CH2SiH3 (1) and n-tetrasilane H3SiSiH2SiH2SiH3 were employed as model systems for the preparation of silicon-rich aminosilanes potentially useful for the deposition of silicon nitride Si3N4. 1 reacts with the appropriate equivalents of diethylamine in an alkane solvent and in the presence of the two-phase catalyst NaNH2/18-crown-6 to give the products (Et2N)2SiHCH2CH2SiH3, (Et2N)2SiHCH2CH2SiH2(NEt2), and (Et2N)2SiHCH2CH2SiH(NEt2)2.By contrast, n-Si4H10 undergoes a cleavage reaction under similar conditions to yield H3SiNEt2 and H2Si(NEt2)2 together with a mixture of polysilanes SinH2n+2, the composition of which is depending on the reaction conditions and the nature of the catalyst (NaH and NaNH2).Diethylaminopolysilanes are also formed, but only in trace quantities.Treatment of n-Si4H10 with pyrrole (C4H5N) leads to the formation of trisilane accompanied by the pyrrolylsilanes H2Si(C4H4N)2, HSi(C4H4N)3, and Si(C4H4N)4.The differences in reactivity suggest excellent leaving group properties of silyl anions in the reaction with amines.
