154093-57-9Relevant articles and documents
sulfonic acid salt, resist composition containing the same, and method of forming pattern using the same
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Paragraph 0113-0116; 0133-0136, (2019/09/14)
The present invention relates to a novel sulfonic acid salt, a resist composition comprising the same, and a method for forming a pattern using the same. The resist composition and the method for forming the pattern using the same of the present invention
Mild synthesis of triarylsulfonium salts with arynes
Zhang, Lei,Li, Xiaojin,Sun, Yan,Zhao, Weizhao,Luo, Fan,Huang, Xin,Lin, Lihui,Yang, Ying,Peng, Bo
, p. 7181 - 7189 (2017/09/07)
Reactions between arynes and alkyl sulfides have been extensively studied over the past few decades. These reactions commonly end with a dealkylation process and thus deliver thioethers as final products. In contrast, the transformation described furnishes valuable triarylsulfonium salts, in lieu of thioethers, from arynes and diarylsulfides. The reaction features mild conditions and a broad substrate scope. A suite of functional groups such as ketones, esters, nitriles, aryl ethers and aryl halides is tolerated, which can be issues faced by traditional synthetic methods. The practicality of the reaction and its extension to the synthesis of triphenyl selenonium salt are also exhibited herein.
Sulfonium salt and its manufacturing method
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, (2008/06/13)
This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound