154093-57-9

Usage

Uses

Cationic photoinitiator. Photoacid generator.

InChI:InChI=1/C18H14FS.CHF3O3S/c19-15-11-13-18(14-12-15)20(16-7-3-1-4-8-16)17-9-5-2-6-10-17;2-1(3,4)8(5,6)7/h1-14H;(H,5,6,7)/q+1;/p-1

Upstream product

• 330-85-8 1-fluoro-4-(phenylthio)benzene 
• 88284-48-4 2-(trimethylsilyl)phenyl trifluoromethanesulfonate 
• 882-33-7 diphenyldisulfane 
• 460-00-4 1-Bromo-4-fluorobenzene 

Downstream Products

• 1311959-27-9 C₂₄H₂₅O₂S₂⁽¹⁺⁾*C₈H₁₀F₃O₅S^(1-) 
• 1311959-26-8 C₂₄H₂₅O₂S₂⁽¹⁺⁾*C₉H₁₁F₄O₅S^(1-) 
• 1311959-20-2 C₂₄H₂₅O₂S₂⁽¹⁺⁾*C₈H₉F₄O₅S^(1-) 
• 1292784-66-7 C₂₄H₂₅O₂S₂⁽¹⁺⁾*Cl^(1-) 

Relevant academic research and scientific papers

Method for preparing triaryl onium sulfate through arylation of diaryl thioether

The invention discloses a method for preparing triaryl onium sulfate through arylation of diaryl thioether. The method specifically comprises the step that in the presence of a fluorine-containing accelerant, diaryl thioether reacts with an aryne precursor in a solvent to synthesize triaryl onium sulfate. Raw materials adopted by the method are cheap and easy to obtain, and the defects of a traditional method that alkalinity is too high, the requirement for the reaction condition is strict, and reaction substrates are limited are overcome. The method has the advantages that the reaction condition is mild, the applicable range of the substrates is wide, the selectivity is good, the yield is high, the product is easy to separate, and the operation is convenient.

sulfonic acid salt, resist composition containing the same, and method of forming pattern using the same

The present invention relates to a novel sulfonic acid salt, a resist composition comprising the same, and a method for forming a pattern using the same. The resist composition and the method for forming the pattern using the same of the present invention

Mild synthesis of triarylsulfonium salts with arynes

Reactions between arynes and alkyl sulfides have been extensively studied over the past few decades. These reactions commonly end with a dealkylation process and thus deliver thioethers as final products. In contrast, the transformation described furnishes valuable triarylsulfonium salts, in lieu of thioethers, from arynes and diarylsulfides. The reaction features mild conditions and a broad substrate scope. A suite of functional groups such as ketones, esters, nitriles, aryl ethers and aryl halides is tolerated, which can be issues faced by traditional synthetic methods. The practicality of the reaction and its extension to the synthesis of triphenyl selenonium salt are also exhibited herein.

Sulfonium salt and its manufacturing method

This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound

Sulfonium salt and its manufacturing method

This invention relates to a sulfonium salt, including its manufacturing method, which is effectively used as a photoacid initiator or radical photoinitiator during polymerization and a photoacid generator, leaving the protection groups of organic compound