17048-10-1 Usage
Uses
Used in Microelectronics and Semiconductor Industries:
Tetrakis(diethylamino)silane is utilized as a precursor for the production of amorphous silicon nitride and silicon carbonitride thin films, which are essential for various applications in these industries. Its contribution to the development of these thin films is crucial for enhancing the performance and reliability of microelectronic devices.
Used in Synthesis of Silicon-Containing Polymers:
As a reagent, tetrakis(diethylamino)silane is employed in the synthesis of polymers that incorporate silicon into their structure. These polymers may exhibit unique properties, such as thermal stability and resistance to environmental degradation, making them suitable for specialized applications.
Used as a Surface Treatment Agent:
Tetrakis(diethylamino)silane serves to improve the adhesion properties of coatings, which is vital for ensuring the longevity and performance of coated surfaces in various applications, including automotive, aerospace, and industrial settings.
Used as an Alternative to Tetraethyl Orthosilicate:
Recognized for its effectiveness, tetrakis(diethylamino)silane is recommended as an alternative to tetraethyl orthosilicate in the production of silicon dioxide films. This substitution can offer benefits in terms of process efficiency and material properties.
Safety Considerations:
Given its flammable and reactive nature, tetrakis(diethylamino)silane requires careful handling and storage to prevent accidents and ensure the safety of personnel and equipment. Proper precautions and adherence to safety guidelines are essential when working with TETRAKIS(DIETHYLAMINO)SILANE.
Check Digit Verification of cas no
The CAS Registry Mumber 17048-10-1 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,7,0,4 and 8 respectively; the second part has 2 digits, 1 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 17048-10:
(7*1)+(6*7)+(5*0)+(4*4)+(3*8)+(2*1)+(1*0)=91
91 % 10 = 1
So 17048-10-1 is a valid CAS Registry Number.
InChI:InChI=1/C16H40N4Si/c1-9-17(10-2)21(18(11-3)12-4,19(13-5)14-6)20(15-7)16-8/h9-16H2,1-8H3
17048-10-1Relevant academic research and scientific papers
Synthesis of tetrakis(dialkylamino)silanes
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Page/Page column 3, (2008/06/13)
A method of synthesizing a substantially pure homoleptic tetrakis secondary amine derivative of silicon, said derivative being substantially free of halogen and having the formula: [in-line-formulae]Si(NRR1)4 [/in-line-formulae]wherein: R and R1 are the same or different and are substituted or unsubstituted straight or branched chain alkyl, groups having from 1 to 6 carbon atoms, said method comprising reacting a silicon halide having the formula: [in-line-formulae]SiX4 [/in-line-formulae]wherein: X is bromine or iodine, with an excess of a secondary amine having the formula: [in-line-formulae]HNRR1 [/in-line-formulae]wherein: R and R1 are as defined as above, for a time and under conditions sufficient to produce a reaction product mixture containing the desired product, Si(NRR1)4.
Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same
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Page 7, (2008/06/13)
The organometallic compound of the present invention is a compound that has bonds between metal atoms and nitrogen atoms or bonds between semimetal atoms and nitrogen atoms, and the content of chlorine in the compound is 200 ppm or less and the content of water is 30 ppm or less. In addition, the general formula of this compound is represented by the following formula (1): M[(R1)2N](n?s)(R2)s??(1) wherein, M represents a metal atom or semimetal atom, with the metal atom being Hf, Zr, Ta, Ti, Ce, Al, V, La, Nb or Ni, and the semimetal atom being Si, R1 represents a methyl group or ethyl group, R2 represents an ethyl group, n represents the valence of M, and s represents an integer of 0 to n?1.
