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17865-85-9

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17865-85-9 Usage

General Description

Octamethylsilsesquioxane, also known as T8, is a silicon-based compound that consists of eight silicon atoms surrounded by oxygen atoms and methyl groups. It is widely used in the cosmetic industry as a filler and skin conditioning agent in skincare and hair care products. Octamethylsilsesquioxane is known for its ability to fill in fine lines and wrinkles, providing a smooth and even appearance to the skin. It is also used in sunscreen and foundation products to improve their texture and spreadability. Additionally, T8 has been found to have low toxicity and is considered safe for use in cosmetic formulations. However, more research is necessary to fully understand its potential long-term effects on human health and the environment.

Check Digit Verification of cas no

The CAS Registry Mumber 17865-85-9 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,7,8,6 and 5 respectively; the second part has 2 digits, 8 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 17865-85:
(7*1)+(6*7)+(5*8)+(4*6)+(3*5)+(2*8)+(1*5)=149
149 % 10 = 9
So 17865-85-9 is a valid CAS Registry Number.

17865-85-9 Well-known Company Product Price

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  • Aldrich

  • (526835)  PSS-Octamethylsubstituted  

  • 17865-85-9

  • 526835-5G

  • 613.08CNY

  • Detail
  • Aldrich

  • (526835)  PSS-Octamethylsubstituted  

  • 17865-85-9

  • 526835-25G

  • 2,116.53CNY

  • Detail

17865-85-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name Permethyloctasilsesquioxane

1.2 Other means of identification

Product number -
Other names Pentacyclo[9.5.1.13,9.15,15.17,13]octasiloxane, octamethyl-

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:17865-85-9 SDS

17865-85-9Downstream Products

17865-85-9Relevant articles and documents

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Barry et al.

, p. 4248,4251 (1955)

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Simple and rapid eco-fnendly synthesis of cubic octamethylsilsesquioxane using microwave irradiation

Iwamura, Takeru,Adachi, Kaoru,Chujo, Yoshiki

, p. 354 - 355 (2010)

Octamethylsilsesquioxane (Me8Si8O12) having a cage structure was rapidly prepared by means of microwave-assisted sol-gel reaction of methyltrimethoxysilane as a trifunctional alkoxysilane with an aqueous basic solution in diglyme as a solvent. Moreover, octamethylsilsesquioxane was obtained as cubic particles in a good yield. Cubic octamethylsilsesquioxane could be formed under microwave irradiation owing to the formation of micelles which are organized by eight methyltrimethoxysilane molecules in diglyme.

Influences of polyhedral oligomeric silsesquioxanes (POSSs) containing different functional groups on crystallization and melting behaviors of POSS/polydimethylsiloxane rubber composites

Zhang, Dian,Shi, Yunhui,Liu, Yufeng,Huang, Guangsu

, p. 41364 - 41370 (2014)

In this article, three kinds of polyhedral oligomeric silsesquioxanes (POSSs) - octamethylsilsesquioxane (OMS), octaphenylsilsesquioxane (OPS) and heptaphenylhydrogensilsesquioxane (H-POSS) - were successfully synthesized. Then, POSSs were incorporated into polydimethylsiloxane (PDMS) rubber through solution blending followed by open two-roll mill blending with curing agent. Finally, the blends were cured with a plate vulcanizing press and the effects of POSSs on crystallization and melting behaviors of PDMS were investigated. DSC tests indicated that crystallinity (Xc) of the OMS/PDMS composite was lowered, while Xcand the melting temperature (Tm) of the OPS/PDMS composite could be significantly enhanced when 20 wt% OPS was incorporated. OPS was proved to play a role as a nucleating agent in the crystallization of PDMS, but its nucleation mechanism was different from H-POSS which was previously studied by us. The crystals of OPS were flake-like with huge surfaces which provide templates for PDMS crystals to grow. However, due to the grafting of H-POSS onto PDMS chains, H-POSS played a role as physical crosslinking points to reduce the mobility of the PDMS chain segments. This journal is

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Sprung,Guenther

, p. 6045 (1955)

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One-Step Synthesis of Siloxanes from the Direct Process Disilane Residue

Neumeyer, Felix,Auner, Norbert

supporting information, p. 17165 - 17168 (2016/11/23)

The well-established Müller–Rochow Direct Process for the chloromethylsilane synthesis produces a disilane residue (DPR) consisting of compounds MenSi2Cl6?n(n=1–6) in thousands of tons annually. Technologically, much effort is made to retransfer the disilanes into monosilanes suitable for introduction into the siloxane production chain for increase in economic value. Here, we report on a single step reaction to directly form cyclic, linear, and cage-like siloxanes upon treatment of the DPR with a 5 m HCl in Et2O solution at about 120 °C for 60 h. For simplification of the Si?Si bond cleavage and aiming on product selectivity the grade of methylation at the silicon backbone is increased to n≥4. Moreover, the HCl/Et2O reagent is also suitable to produce siloxanes from the corresponding monosilanes under comparable conditions.

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