18547-01-8Relevant academic research and scientific papers
CYCLIC SILOXANE COMPOUND, Si-CONTAINING FILM-FORMING MATERIAL, AND USE THEREOF
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Page/Page column 21, (2010/11/28)
The present invention has the objects to provide a novel material for forming Si-containing film, especially a material containing a cyclic siloxane compound suitable to a PECVD equipment for low dielectric constant insulating film, and to provide an Si-c
Syntheses and properties of sila-functional oligosiloxanes - Linear and cyclic tetrasiloxanes with methyl and vinyl groups
Gunji, Takahiro,Watanabe, Miho,Abe, Koji,Abe, Yoshimoto
, p. 341 - 346 (2007/10/03)
The syntheses of the titled oligosiloxanes by controlled hydrolysis of the corresponding isocyanatosilanes under vapor phase or in THF (or THF/ether) were investigated. The vapor phase hydrolysis of RSi(NCO)3 (R = Me, Vinyl) with a water-1,4-dioxane vapor gave the disiloxanes [R(OCN)2Si]2O in yields of 85% (R = Me) and 90% (R = Vinyl). Further vapor phase hydrolysis of the disiloxanes provided the linear tetrasiloxanes NCO[SiR(NCO)O]3SiR(NCO)2 in yields of 71% (R = Me) and 69% (R = Vinyl). The cyclotetrasiloxanes [R(OCN)SiO]4 were synthesized in yields of 12% (R = Me) and 33% (R = Vinyl) or 24% (R = Me) and 58% (R = Vinyl) by hydrolysis of the disiloxanes or of the linear tetrasiloxanes in THF, respectively. On the other hand, the linear tetrasiloxanes OCN[SiR(OPri)O]3SiR-(OPri)(NCO) were obtained in yields of 50% (R = Me) and 56% (R = Vinyl) by hydrolysis of [R(OCN)(PriO)Si]2O prepared from RSi(OPri)(NCO)2 under mild conditions in THF/ether, while the cyclic tetrasiloxanes [R(PriO)SiO]4 were afforded in the yield of 61-62% by hydrolysis of the disiloxanes under more severe conditions in THF.
