1886-74-4

Usage

Uses

Used in Organic Synthesis:
Benzene, 1,1'-[(diazomethylene)bis(sulfonyl)]bisis utilized as a diazo transfer reagent in organic synthesis. Its reactivity allows for the transfer of diazo groups to other molecules, facilitating the formation of new chemical bonds and structures.
Used in Preparation of Sulfonyl Hydrazones:
Benzene, 1,1'-[(diazomethylene)bis(sulfonyl)]bisis also employed in the preparation of sulfonyl hydrazones, which serve as crucial intermediates in a variety of chemical processes. The ability to produce these intermediates makes Benzene, 1,1'-[(diazomethylene)bis(sulfonyl)]bisa valuable asset in the synthesis of complex organic molecules.
Used in Chemical Research:
Due to its reactivity and potential hazards, Benzene, 1,1'-[(diazomethylene)bis(sulfonyl)]bisis often used in chemical research to study the properties and reactions of diazomethane derivatives. This research can lead to the development of new synthetic methods and applications in the field of organic chemistry.
Used in Pharmaceutical Industry:
Although not explicitly mentioned in the provided materials, given its role in organic synthesis and the preparation of intermediates, Benzene, 1,1'-[(diazomethylene)bis(sulfonyl)]bismay also find applications in the pharmaceutical industry for the synthesis of drug molecules.

Upstream product

• 14928-04-2 1,1,4,4-tetrabromo-2,3-diazabuta-1,3-diene 
• 873-55-2 sodium benzenesulfonate 
• 1886-82-4 Bis-(phenyl-sulfonyl)-formaldehyd-hydrazon 
• 515-42-4 sodium phenylsulfonate 
• 3406-02-8 bis(phenylsulfonyl)methane 

Downstream Products

• 2292-72-0 Dimethylsulfonium- 
• 1819-27-8 -aethyl-aether 
• 1819-29-0 -n-butyl-sulfid 
• 1819-25-6 Bis-phenylsulfonyl-keton-phenylhydrazon 
• 161768-68-9 4-Benzenesulfonyl-6-phenyl-thieno[3,4-b]furan 
• 53799-65-8 C₂₀H₁₈O₄S₃ 
• 39153-65-6 1-Phenylbutan-1,2,3-trion-2-(β-acetyl-β-benzoylvinyl-hydrazon) 
• 1807-63-2 α--β-(bis-benzolsulfonyl-methylen)-hydrazin 
• 1807-64-3 α-Diphenylmethylen-β-(bis-benzolsulfon-methylen)-hydrazin 

Relevant academic research and scientific papers

Laser flash photolysis of diphenylsulfonyldiazomethane: Detection of the sulfene and a sulfene-pyridine ylide

(matrix presented) The photochemistry of diphenylsulfonyldiazomethane (DSD) was studied by means of nanosecond laser flash photolysis. The photochemical behavior of this molecule upon UV irradiation is characterized by sulfene formation, presumed to arise via Wolff rearrangement of a carbene. We were able to detect the sulfene and the sulfene ylide formed upon sulfene trapping by pyridine. Sulfene quenching by nucleophiles was also examined.

Sulfonates, polymers, resist compositions and patterning process

A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F. A polymer comprising units derived from the sulfonate compound is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance

Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process

Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

Novel carbazole derivative and chemically amplified radiation-sensitive resin composition

A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.

Rhodium-carbenoid mediated O-H insertion reactions. O-H insertion vs. H-abstraction and effect of catalyst

The synthesis and rhodium mediated O-H insertion reactions of a wide range of diazo compounds are described. The rate at which the diazo compounds decompose in the presence of 2-propanol and the rhodium catalyst is strongly dependent on the electron withdrawing group(s) attached to the diazo carbon, with diazophosphonates being the least reactive. Insertion into the O-H bond of methanol, t-butanol and phenols was also investigated, as well as the effect of catalyst. In some cases 'reduction' of the diazo group to the corresponding CH2 group competes with O-H insertion, although this is highly catalyst and substrate dependent. Of the catalysts used, rhodium(II) trifluoroacetamide is the most effective for O-H insertion reactions.

A Simple Procedure for Preparation of α-Diazocarbonyl Compounds

The use of 1,8-diazabicycloundec-7-ene as a base in Regitz reaction leads to improved yields of α-diazocarbonyl compounds in much shorter time (15 min).