19158-66-8

Upstream product

• 110-01-0 thiophene 
• 70-11-1 α-bromoacetophenone 

Downstream Products

• 20912-85-0 benzoyl(tetrahydrothiophenio)methanide 
• 94360-59-5 trans-2-benzoyl-3-(4'-methoxyphenyl)-1,1-dicyanocyclopropane 
• 1189745-72-9 C₉H₉F₂O₈S₂^(1-)*C₁₂H₁₅OS⁽¹⁺⁾ 
• 85460-60-2 (3-(2-chlorophenyl)cyclopropane-1,2-diyl)bis(phenylmethanone) 
• 85460-60-2 (3-(2-chlorophenyl)cyclopropane-1,2-diyl)bis(phenylmethanone) 
• 41570-74-5 t-1,t-2-dibenzoyl-r-3-(4'-bromophenyl)cyclopropane 
• 1085985-28-9 (3-(4-methylphenyl)cyclopropane-1,2-diyl)bis(phenylmethanone) 
• 85460-61-3 (3-(4-methoxyphenyl)cyclopropane-1,2-diyl)bis(phenylmethanone) 
• 85460-61-3 (3-(4-methoxyphenyl)cyclopropane-1,2-diyl)bis(phenylmethanone) 

Relevant academic research and scientific papers

Synthesis of SCF3-Substituted Sulfonium Ylides from Sulfonium Salts or α-Bromoacetic Esters

A metal-free direct trifluoromethylthiolation of sulfonium ylides with an electrophilic trifluoromethylthiolating reagent has been established, in which sulfonium salt or α-bromoacetic ester is employed as sulfonium ylide precursors. This trifluoromethylthiolation enables the straightforward construction of SCF3-substituted sulfonium ylides from a wide range of substrates, including ketones, esters, and even PEGylated substrates. Moreover, the application of this approach in large-scale preparation and the fluorescence and fluorine-19 magnetic resonance imaging capabilities of the product are also explored. (Figure presented.).

Practical and regioselective halo-trifluoromethylthiolation of sulfur ylides

A H2O mediated practical and highly regioselective chloro- and bromo-trifluoromethylthiolation of sulfur ylides is reported using a difunctionalization strategy. In the reaction sequence, sulfur ylides presumably react with an electrophilic trifluoromethylthiolating reagent to generate an α-SCF3 substituted sulfonium salt intermediate, which then undergoes a substitution with nucleophilic halogens. This journal is

Chlorotrifluoromethylthiolation of Sulfur Ylides for the Formation of Tetrasubstituted Trifluoromethylthiolated Alkenes

Tetrasubstituted trifluoromethylthiolated alkenes can be accomplished directly through the chlorotrifluoromethylthiolation of sulfur ylides utilizing nucleophilic halide reagent and electrophilic SCF3 reagent. This cascade reaction is mild, highly practical, easy to manipulate, uses catalyst-free conditions, and demonstrates a wide substrate range with excellent functional group tolerance, furnishing E-selective products in good to high yields. The synthetic utility of this approach is documented through gram-scale preparation and late-stage modification of pharmaceutically relevant compounds, making it suitable for drug discovery.

NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME

There is disclosed a sulfonate shown by the following general formula (2). R1—COOC(CF3)2—CH2SO3?M+??(2) (In the formula, R1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M+ represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.

Metal-free carbon-carbon cross-couplings between the ion pairs in sulfonium tetraphenylborates

A series of sulfonium tetraphenylborates can be readily prepared by the metathesis of sulfonium halides with sodium tetraphenylborates. After heating at 120-150 °C, the sulfonium tetraphenylborates can smoothly undergo the cross-couplings between the tetraphenylborate anions and the sulfonium cations in the absence of a metal catalyst. For carbonylmethyl-, benzyl-, and allylsulfoniums, the corresponding carbonylmethyl-phenyl, benzyl-phenyl, and allyl-phenyl cross-coupling products can be obtained in 22-76% yields. An interionic electron-transfer mechanism for this cross-coupling reaction is proposed.

One-pot synthesis of cyclopropane derivatives with a cis : Trans stereoselectivity by Wittig olefination-sulfur ylide cyclopropanation sequence

Cyclopropane derivatives were synthesised in one pot from aromatic aldehydes, phenacyltriphenylphosphonium bromide, and S-phenacylthiolanium bromide by a Wittig olefination-sulfur ylide cyclopropanation sequence. When Cs2CO3 was used as the base and CH3CN/water (8:2, v/v) as the solvent, the major product was the cis-1,2-dibenzoyl cyclopropane. In contrast, when using DBU as the base and MeOH as the solvent, the major product was transdibenzoyl cyclopropane. In some cases, the major isomer was obtained in high purity and good yield by simple filtration.

PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS

The photoacid generator produces a sulfonic acid which has a bulky cyclic structure in the sulfonate moiety and a straight-chain hydrocarbon group and thus shows a controlled acid diffusion behavior and an adequate mobility. The PAG is fully compatible with a resin to form a resist composition which performs well during the device fabrication process and solves the problems of resolution, LWR, and exposure latitude.

POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C10 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C2-C20 hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS

A sulfonium salt has formula (1) wherein R1 is a monovalent hydrocarbon group except vinyl and isopropenyl, R2, R3, and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl or may bond together to form a ring with the sulfur atom, and n is 1 to 3. A chemically amplified resist composition comprising the sulfonium salt is capable of forming a fine feature pattern of good profile after development due to high resolution, improved focal latitude, and minimized line width variation and profile degradation upon prolonged PED.