19799-44-1 Usage
General Description
2,5-Thiophenedicarboxylic acid, 3,4-bis(4-methoxyphenyl)- is a chemical compound with the molecular formula C20H16O6S and a molar mass of 384.41 g/mol. It is a derivative of thiophene and features two carboxylic acid groups positioned at the 2 and 5 positions of the thiophene ring, as well as two 4-methoxyphenyl groups at the 3 and 4 positions. 2,5-Thiophenedicarboxylic acid, 3,4-bis(4-methoxyphenyl)- is used in the synthesis of various pharmaceuticals and agrochemicals due to its potential biological activity. Additionally, it has been studied for its potential as a building block for the production of organic semiconductors and materials for optoelectronics.
Check Digit Verification of cas no
The CAS Registry Mumber 19799-44-1 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,9,7,9 and 9 respectively; the second part has 2 digits, 4 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 19799-44:
(7*1)+(6*9)+(5*7)+(4*9)+(3*9)+(2*4)+(1*4)=171
171 % 10 = 1
So 19799-44-1 is a valid CAS Registry Number.
19799-44-1Relevant academic research and scientific papers
De novo synthesis of thiophenes on a polymeric support
Traversone, Antonio,Brill, Wolfgang K.-D.
, p. 3535 - 3538 (2008/02/06)
The Hinsberg thiophene synthesis was expanded to support bound thioglycolic acid derived synthons, which reacted with arils to give thiophenes in high purity.
Method of treating skin related conditions
-
, (2008/06/13)
A class of 3,4-diaryl substituted thiophene, derivatives and analogs thereof, pharmaceutical compositions containing them and methods of using them to treat inflammation and inflammation-related disorders. Compounds of particular interest are defined by Formula I: wherein Y is S; wherein X is one or two substituents selected from hydrido, halo, lower alkoxycarbonyl and carboxyl; wherein R2 and R3 are independently aryl or heteroaryl; and wherein R2 and R3 are optionally substituted with one or more radicals selected from sulfamyl, alkylsulfonyl, halo, lower alkoxy and lower alkyl; or a pharmaceutically-acceptable salt thereof.
