199122-93-5

Usage

Also known as

2-nitrobenzene-1-propanol chloride

Type of compound

Organic compound

Derivative of

Nitrobenzene

Common uses

Synthesis of pharmaceuticals and agrochemicals

Physical color

Yellow-to-brown

Usage

Intermediate in the production of various chemicals

Potential applications

Organic chemistry field

Safety precautions

Can be harmful if ingested, inhaled, or comes in contact with the skin or eyes

Upstream product

• 64987-77-5 2-(2-nitrophenyl)propanol 
• 612-22-6 2-nitro(ethylbenzene) 

Downstream Products

• 199122-97-9 2-(2-nitrophenyl)propylsulfonyl chloride 
• 215600-76-3 2-(2-Nitro-phenyl)-propane-1-sulfonic acid (2R,3S,5R)-3-hydroxy-5-{6-[2-(4-nitro-phenyl)-ethoxy]-2-[2-(4-nitro-phenyl)-ethoxycarbonylamino]-purin-9-yl}-tetrahydro-furan-2-ylmethyl ester 
• 215600-72-9 2-(2-Nitro-phenyl)-propane-1-sulfonic acid (2R,3S,5R)-3-hydroxy-5-{6-[2-(4-nitro-phenyl)-ethoxycarbonylamino]-purin-9-yl}-tetrahydro-furan-2-ylmethyl ester 
• 215600-69-4 2-(2-Nitro-phenyl)-propane-1-sulfonic acid (2R,3S,5R)-3-hydroxy-5-{4-[2-(4-nitro-phenyl)-ethoxycarbonylamino]-2-oxo-2H-pyrimidin-1-yl}-tetrahydro-furan-2-ylmethyl ester 
• 199123-06-3 2-(2-Nitro-phenyl)-propane-1-sulfonic acid (2R,3S,5R)-3-hydroxy-5-(5-methyl-2,4-dioxo-3,4-dihydro-2H-pyrimidin-1-yl)-tetrahydro-furan-2-ylmethyl ester 

Relevant academic research and scientific papers

Nucleoside derivatives with photolabile protective groups

The invention relates to nucleo-side derivatives with photo-unstable protective groups of the general formula (I) in which R1 is H, NO2, CN, OCH3, halogen, alkyl or alkoxyalkyl with 1 to 4 C atoms, R2 is H, OCH3, R3 is H, F, Cl, Br, NO2 or an aliphatic ac

New photolabile protecting groups in nucleoside and nucleotide chemistry - Synthesis, cleavage mechanisms and applications

New photolabile protecting groups have been found in the 2-(2- nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. β-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced β-elimination process is proposed.