199123-06-3Relevant academic research and scientific papers
New photolabile protecting groups of the 2-(2- nitrophenyl)ethoxycarbonyl-and the 2-(2-nitrophenyl)ethylsulfonyl-type for the oligonucleotide synthesis
Buehler,Giegrich,Pfleiderer
, p. 1281 - 1283 (2007/10/03)
New photolabile blocking groups have been synthesized and introduced into the 5'-OH position of thymidine. The 5'-O-protected thymidines were irradiated at 365 nm under identical conditions and the half-lives and thymidine yields were determined to investigate the influence of different substituents in the two corresponding series.
New photolabile protecting groups in nucleoside and nucleotide chemistry - Synthesis, cleavage mechanisms and applications
Giegrich,Eisele-Buehler,Hermann,Kvasyuk,Charubala,Pfleiderer
, p. 1987 - 1996 (2007/10/03)
New photolabile protecting groups have been found in the 2-(2- nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. β-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced β-elimination process is proposed.
