21739-99-1 Usage
General Description
2,3,6-tribromo benzoic acid is a chemical compound that falls into the category of benzoic acids, which are aromatic carboxylic acids. It is a derivative of benzoic acid with three bromine atoms attached at the 2nd, 3rd, and 6th position on the benzene ring. Benzoic acid, 2,3,6-tribroMo- is commonly used as a reagent in organic synthesis and is also known for its use as a pharmaceutical intermediate. Its unique chemical structure and properties make it a valuable building block in the production of various pharmaceuticals and organic compounds. Additionally, the presence of bromine atoms in the compound also gives it potential applications in flame retardants and other industrial processes.
Check Digit Verification of cas no
The CAS Registry Mumber 21739-99-1 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,1,7,3 and 9 respectively; the second part has 2 digits, 9 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 21739-99:
(7*2)+(6*1)+(5*7)+(4*3)+(3*9)+(2*9)+(1*9)=121
121 % 10 = 1
So 21739-99-1 is a valid CAS Registry Number.
21739-99-1Relevant articles and documents
Extensive halogen scrambling and buttressing effects encountered upon treatment of oligobromoarenes with bases
Mongin, Florence,Marzi, Elena,Schlosser, Manfred
, p. 2771 - 2777 (2007/10/03)
As a rule, tri-, tetra- and pentahaloarenes readily undergo ortho-lithiation when treated with amide-type bases. However, halogen migration occurs whenever the substrate contains three or more contiguous halogen atoms, provided that at least one of them is bromine or iodine. Dismutation and reduction processes often take place concomitantly. In this manner, a variety of organometallic intermediates may be formed, the driving force always being a decrease in basicity. When no such energy gain can be achieved, a sterically crowded substrate may just turn out to be inert; this was found to be the case with 1,5-dibromo-3-fluoro-2-(trimethylsilyl)benzene, 1,5-dibromo-3-fluoro-2,4-bis(trimethylsilyl)benzene, and 1,5-dibromo-3-fluoro-2,4-diiodobenzene. Buttressing effects are apparently strong enough to prevent expedient deprotonation of those substrates.
