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Disilene, tetramethyl- is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

22843-41-0

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22843-41-0 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 22843-41-0 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,2,8,4 and 3 respectively; the second part has 2 digits, 4 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 22843-41:
(7*2)+(6*2)+(5*8)+(4*4)+(3*3)+(2*4)+(1*1)=100
100 % 10 = 0
So 22843-41-0 is a valid CAS Registry Number.

22843-41-0SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name Si2Me4

1.2 Other means of identification

Product number -
Other names tetramethyl-disilylene

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:22843-41-0 SDS

22843-41-0Downstream Products

22843-41-0Relevant academic research and scientific papers

High-pressure Synthesis, Structure and Novel Photochemical Reactions of 7,7,8,8-Tetramethyl-7,8-disilabicycloocta-2,5-diene

Sekiguchi, Akira,Maruki, Ikutaro,Ebata, Keisuke,Kabuto, Chizuko,Sakurai, Hideki

, p. 341 - 343 (2007/10/02)

7,7,8,8-Tetramethyl-7,8-disilabicycloocta-2,5-diene 1, prepared by the high-pressure reaction (10000 bar) of 1,1,2,2-tetramethyl-1,2-disilacyclohexa-3,5-diene and phenyl vinyl sulphoxide followed by elimination of benzenesulphenic acid, gave tetramethyldisilene (Me2Si=SiMe2) upon photolysis which underwent a photochemical reaction with benzene at 10 K in an argon matrix to regenerate the precursor.

MISE EN EVIDENCE DE LA FORMATION DE R2M=MR2 A PARTIR DE DISILA-1,2 ET DIGERMA-1,2 CYCLOHEXENES-4

Marchand, Annette,Gerval, Pierre,Duboudin, Francoise,Gaufryau, M.-H.,Joanny, Marguerite,Mazerolles, Pierre

, p. 93 - 106 (2007/10/02)

Intermediates with ?-bonded Si or Ge are generated during gas phase pyrolysis of 1,2-disila- or 1,2-digerma-cyclohex-4-enes. Compounds such as R2M=MR2 are successfully trapped by addition or and cycloadditions.These results were proved by mass spectrometry.

PHOTOCHEMICAL GENERATION OF TETRAMETHYLDISILENE AND PHOTOINDUCED 1,2-SILYL-MIGRATION

Nakadaira, Yasuhiro,Otsuka, Tatsuo,Sakurai, Hideki

, p. 2417 - 2420 (2007/10/02)

Described herein is the first clear evidence of the photochemical generation of tetramethyldisilene which can be efficiently trapped by dienes.An intriguing 1,2-photo-induced silyl migration is also reported.

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