248261-71-4

Upstream product

• 483-15-8 7,8-dihydroberberine 
• 100-39-0 benzyl bromide 

Relevant academic research and scientific papers

Improved enamine-type addition of dehydroaporphine using microwave irradiation

Previous report demonstrated that 7-substituted aporphine, possessing interesting biological aspects, could be synthesized via an enamine-type addition of dehydroaporphine reacted with an electrophile, but it has the drawbacks of a long reaction time, low yield, and limitation to reactive electrophiles. Here we found that the reaction time and yield could greatly be improved under microwave irradiation in the presence of 4 equiv of sodium iodide for the synthesis of 7-benzyl dehydroglaucine. The application of this finding for treating dehydroglaucine with a variety of alkyl bromides also gave corresponding 7-substituted dehydroglaucines (2a-j) with yields of 14-89%. Other enamines such as 1,10-dimethoxydehydroaporphine (3a), 2,9-diacetyldehydroboldine (3b), and 7,8-dihydroberberine (5) were found to react with benzyl bromide under similar conditions as described above to give corresponding products (4a-b, 6) in satisfactory yields, indicating the versatility of this improved reaction condition.

PHARMACEUTICALLY AVAILABLE PROTOBERBERINE SALTS DERIVATIVES, AND PROTOBERBERINE DERIVATIVES AND SALTS THEREOF

The antifungal formulation comprising the novel compounds of the following chemical formulae (I) and (II) exhibit in vitro antifungal activity against fungi including cutaneous filamentous fungus, such as Epidermophyton, Microsporum, Trichophyton, Sporothrix schenckii, Aspergillus or Candida. The formulation of the present invention exhibit in vitro antifungal activity at the concentration of 1-100 mu g/ml. wherein R1, R2, and R4 may be the same or different, and represent C1-C5 alkoxy, R3 represents hydrogen or C1-C10 alkyl, A- represents inorganic acid ion, organic acid ion or halide, R5 represents hydrogen, pyridylmethyl, substituted pyridylmethyl or a group having the following chemical formula(XI) wherein Z1, Z2, Z3, Z4 and Z5 may be the same or different and represent hydrogen, halogen, C1-C5 alkyl, trifluoromethyl, phenyl, substituted phenyl, nitro, C1-C4 alkoxy, C1-C4 alkylamino, acetylamino, C1-C8 trialkyl ammonium, guanidinyl, methylthio, ethylthio, trifluoromethoxy, hydroxy, phenoxy, vinyl, carboxyl and C1-C2 alkoxycarbonyl group.

Antifungal formulation comprising protoberberine derivatives and salts thereof

The antifungal formulation comprising the novel compounds of the following chemical formulae (I) and (II) exhibit in vitro antifungal activity against fungi including cutaneous filamentous fungus, such as Epidermophyton, Microsporum, Trichophyton, Sporothrix schenckii, Aspergillus or Candida. The formulation of the present invention exhibit in vitro antifungal activity at the concentration of 1-100 mu g/ml. wherein R1, R2, and R4 may be the same or different, and represent C1-C5 alkoxy, R3 represents hydrogen or C1-C10 alkyl, A- represents inorganic acid ion, organic acid ion or halide, R5 represents hydrogen, pyridylmethyl, substituted pyridylmethyl or a group having the following chemical formula(XI) wherein Z1, Z2, Z3, Z4 and Z5 may be the same or different and represent hydrogen, halogen, C1-C5 alkyl, trifluoromethyl, phenyl, substituted phenyl, nitro, C1-C4 alkoxy, C1-C4 alkylamino, acetylamino, C1-C8 trialkyl ammonium, guanidinyl, methylthio, ethylthio, trifluoromethoxy, hydroxy, phenoxy, vinyl, carboxyl and C1-C2 alkoxycarbonyl group.

Pharmaceutically available protoberberine salts derivatives, and protoberberine salts derivatives, and protoberberine derivatives and salts thereof

The novel compounds of the following chemical formulae (I) and (II) exhibit in vitro antifungal activity against fungi including cutaneous filamentous fungus, such as Epidermophyton, Microsporum, Trichophyton, Sporothrix schenckii, Aspergillus or Candida. The compounds of the present invention exhibit in vitro antifungal activity at the concentration of 1-100 μg/ml. STR1 wherein R1, R2, and R4 may be the same or different, and represent C1 -C5 alkoxy, R3 represents hydrogen or C1 -C10 alkyl, A- represents inorganic acid ion, organic acid ion or halide, R5 represents hydrogen, pyridylmethyl, substituted pyridylmethyl or a group having the following chemical formula(XI) STR2 wherein Z1, Z2, Z3, Z4 and Z5 may be the same or different and represent hydrogen, halogen, C1 -C5 alkyl, trifluoromethyl, phenyl, substituted phenyl, nitro, C1 -C4 alkoxy, C1 -C4 alkylamino, acetylamino, C1 -C8 trialkyl ammonium, guanidinyl, methylthio, ethylthio, trifluoromethoxy, hydroxy, phenoxy, vinyl, carboxyl and C1 -C2 alkoxycarbonyl group.