26346-84-9

Upstream product

• 7446-09-5 sulfur dioxide 
• 879-05-0 2,3,4,5,6-pentafluorophenylmagnesium bromide 
• 13780-57-9 pentafluorosulfanyl chloride 
• 1076-44-4 pentafluorophenyl lithium 
• 15607-89-3 pentafluorosulfanyl bromide 
• 344-04-7 bromopentafluorobenzene 
• 1840-68-2 cis-SF₄(OCF₃)2 
• 363-72-4 Pentafluorobenzene 
• 36649-98-6 pentafluorobenzenesulfinyl fluoride 
• 7719-09-7 thionyl chloride 

Downstream Products

• 75169-07-2 1,2,3,4,6,7,8,9-Octafluoro-10-p-tolyl-10H-phenothiazine 5-oxide 
• 75169-08-3 1,2,3,4,6,7,8,9-Octafluoro-10-(4-methoxy-phenyl)-10H-phenothiazine 5-oxide 
• 75169-06-1 1,2,3,4,6,7,8,9-Octafluoro-10-phenyl-10H-phenothiazine 5-oxide 
• 75169-11-8 2-N-methylanilinononafluorodiphenyl sulfoxide 
• 52331-32-5 4-(OHC₆F₄)2S 
• 61907-46-8 Bis(2,3,5,6-Tetrafluoro-4-aminophenyl) sulphide 
• 61907-45-7 (4-CH₃OC₆F₄)2S 
• 52331-33-6 Bis-(4-methylthiotetrafluorphenyl)-sulfid 
• 60190-20-7 C₁₈H₁₈F₄S₇ 
• 54378-69-7 1,3,4-Tris-(methylthio)-2,5-difluor-benzol 
• 434-90-2 decafluorobiphenyl 
• 2342-07-6 perfluorotetralin 
• 1043-50-1 pentafluorophenyl sulfide 
• 75169-09-4 10-(4-Bromo-phenyl)-1,2,3,4,6,7,8,9-octafluoro-10H-phenothiazine 5-oxide 

Relevant academic research and scientific papers

CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

PROBLEM TO BE SOLVED: To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern with good line edge roughness (LER). SOLUTION: A salt represented by formula (I) and a resist composition containing the same are provided. [In the formula, R1-R6 each independently represent a halogen atom or the like; R7 and R8 each independently represent a halogen atom or the like; R9 represents a hydrogen atom or an alkyl group, provided that -CH2- in the group may be substituted with -O- or -CO-; m7 and m8 each represent an integer of 0-2; m9 represents an integer of 0-5; and X0 represents an optionally substituted hydrocarbon group.] SELECTED DRAWING: None COPYRIGHT: (C)2021,JPOandINPIT

SALT, ACID GENERATOR, RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

PROBLEM TO BE SOLVED: To provide a salt and a resist composition capable of producing a resist pattern with good CD uniformity (CDU). SOLUTION: A salt represented by formula (I), an acid generator, and a resist composition containing the same are provided. [R1, R2, R3, R4, R5 and R6 each represent a halogen atom or the like; R7 and R8 each represent a halogen atom, OH or the like; R9 represents H or an alkyl group; m7 and m8 each represent an integer of 0-2; m9 represents an integer of 0-5; Q1 and Q2 each represent F or a perfluoroalkyl group; L1 represents a substituted/unsubstituted saturated hydrocarbon group; and Y1 represents a substituted/unsubstituted methyl group or alicyclic hydrocarbon group.] SELECTED DRAWING: None COPYRIGHT: (C)2021,JPO&INPIT