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29489-57-4

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29489-57-4 Usage

General Description

Tris(dimethylamino)ethylsilane is a chemical compound that falls into the category of organosilicon compounds. TRIS(DIMETHYLAMINO)ETHYLSILANE, often used in research and industrial processes, is characterized by its three dimethylamino groups and one ethyl group attached to a silicon atom. Like other organosilicons, Tris(dimethylamino)ethylsilane has particular physical and chemical properties that make it beneficial in specific applications, often relating to its reactivity with other substances. Its specific uses and safety measures can vary depending on its concentration and form, hence it is important to handle this chemical substance with precaution following safety guidelines.

Check Digit Verification of cas no

The CAS Registry Mumber 29489-57-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 2,9,4,8 and 9 respectively; the second part has 2 digits, 5 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 29489-57:
(7*2)+(6*9)+(5*4)+(4*8)+(3*9)+(2*5)+(1*7)=164
164 % 10 = 4
So 29489-57-4 is a valid CAS Registry Number.
InChI:InChI=1/C8H23N3Si/c1-8-12(9(2)3,10(4)5)11(6)7/h8H2,1-7H3

29489-57-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name TRIS(DIMETHYLAMINO)ETHYLSILANE

1.2 Other means of identification

Product number -
Other names Si-ethyl-hexa-N-methyl-silanetriamine

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:29489-57-4 SDS

29489-57-4Downstream Products

29489-57-4Relevant articles and documents

Compounds useful as chemical precursors in chemical vapor deposition of silicon-based ceramic materials

-

, (2008/06/13)

In order to reduce the rate of coke formation during the industrial pyrolysis of hydrocarbons, the interior surface of a reactor is coated with a thin layer of a ceramic material, the layer being deposited by thermal decomposition of a non-oxygen containing silicon-nitrogen precursor in the vapor phase, tin an inert or reducing gas atmosphere in order to minimize the formation of oxide ceramics.

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