3192-07-2 Usage
Organosulfur compound
It is an organic compound that contains sulfur, which is a key element in its chemical properties and reactivity.
Chemical intermediate
It is frequently used as a starting material or intermediate in the production of various pharmaceuticals and agrochemicals, as well as in other industries.
Highly reactive nature
2-(2-nitrophenyl)ethylsulfonyl chloride is known for its high reactivity, making it a useful reagent in organic synthesis.
Introduction of sulfonyl groups
It is often used to introduce sulfonyl groups (-SO2-) onto other molecules, which can alter the properties and reactivity of those molecules.
Building block in synthesis
2-(2-nitrophenyl)ethylsulfonyl chloride serves as a valuable building block in the synthesis of a wide range of biologically active compounds.
Chemical research and development
Due to its reactivity and utility in introducing sulfonyl groups, it is a valuable tool in the field of chemical research and development.
Hazardous material
It is considered a hazardous material due to its potential for causing irritation and other health hazards.
Handling and storage precautions
2-(2-nitrophenyl)ethylsulfonyl chloride should be handled and stored with caution to minimize the risk of exposure and potential health hazards.
Check Digit Verification of cas no
The CAS Registry Mumber 3192-07-2 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,1,9 and 2 respectively; the second part has 2 digits, 0 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 3192-07:
(6*3)+(5*1)+(4*9)+(3*2)+(2*0)+(1*7)=72
72 % 10 = 2
So 3192-07-2 is a valid CAS Registry Number.
3192-07-2Relevant academic research and scientific papers
Nucleoside derivatives with photolabile protective groups
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, (2008/06/13)
The invention relates to nucleo-side derivatives with photo-unstable protective groups of the general formula (I) in which R1 is H, NO2, CN, OCH3, halogen, alkyl or alkoxyalkyl with 1 to 4 C atoms, R2 is H, OCH3, R3 is H, F, Cl, Br, NO2 or an aliphatic ac
New photolabile protecting groups of the 2-(2- nitrophenyl)ethoxycarbonyl-and the 2-(2-nitrophenyl)ethylsulfonyl-type for the oligonucleotide synthesis
Buehler,Giegrich,Pfleiderer
, p. 1281 - 1283 (2007/10/03)
New photolabile blocking groups have been synthesized and introduced into the 5'-OH position of thymidine. The 5'-O-protected thymidines were irradiated at 365 nm under identical conditions and the half-lives and thymidine yields were determined to investigate the influence of different substituents in the two corresponding series.
New photolabile protecting groups in nucleoside and nucleotide chemistry - Synthesis, cleavage mechanisms and applications
Giegrich,Eisele-Buehler,Hermann,Kvasyuk,Charubala,Pfleiderer
, p. 1987 - 1996 (2007/10/03)
New photolabile protecting groups have been found in the 2-(2- nitrophenyl)ethoxycarbonyl and the 2-(2-nitrophenyl)ethylsulfonyl group, respectively. The influence of substituents at the phenyl ring as well as the side-chain has been investigated regarding the photolysis rates on irradiation at 365 mn. β-Branching in the side-chain leads to highly increased rates of photodeprotection. A new type of photocleavage mechanism consisting of a photoinduced β-elimination process is proposed.
