3768-57-8 Usage
Uses
Used in Adhesives, Sealants, and Coatings Industry:
TRIS(DIMETHYLAMINO)METHYLSILANE is used as a silane coupling agent for improving the adhesion and durability of adhesives, sealants, and coatings. Its ability to form strong molecular bonds between different surfaces contributes to the enhanced performance and longevity of these products.
Used in Synthesis of Silicon-based Polymers:
TRIS(DIMETHYLAMINO)METHYLSILANE is used as a precursor in the synthesis of silicon-based polymers. Its reactivity aids in the formation of these polymers, which have a wide range of applications in various industries, including electronics, automotive, and construction.
Used in Catalyst for Silicon-Organic Compounds Formation:
TRIS(DIMETHYLAMINO)METHYLSILANE is utilized as a catalyst in the formation of silicon-organic compounds. Its role in catalyzing reactions allows for the efficient production of these compounds, which are used in various applications such as pharmaceuticals, agrochemicals, and materials science.
Check Digit Verification of cas no
The CAS Registry Mumber 3768-57-8 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 3,7,6 and 8 respectively; the second part has 2 digits, 5 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 3768-57:
(6*3)+(5*7)+(4*6)+(3*8)+(2*5)+(1*7)=118
118 % 10 = 8
So 3768-57-8 is a valid CAS Registry Number.
InChI:InChI=1/C7H21N3Si/c1-8(2)7(11,9(3)4)10(5)6/h1-6,11H3
3768-57-8Relevant academic research and scientific papers
SILICON PRECURSOR AND METHOD OF MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME
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Paragraph 0069-0074, (2021/09/10)
The present invention relates to a vapor deposition compound capable of thin film deposition through vapor deposition, and particularly to a silicon precursor capable of being applied to ALD or CVD, and specifically, enabling high temperature deposition, and a method of manufacturing a silicon-containing thin film.
Chloraminosilanes II. Preparation and spectroscopic studies on alkyl-(dimethylamino)chlorosilanes
Washburne,Peterson Jr.
, p. 59 - 64 (2007/10/12)
Several new compounds containing both chloro and dimethylamino groups linked to silicon have been prepared. The general method involved reacting a solution of the appropriate polychlorosilane in ether at ca. - 50° with a chilled ethereal solution of dimethylamine. Prepared in this fashion were CH3Si(NMe2)Cl2, CH3Si(NMe2)2-Cl, PhSi(NMe2)Cl2, PhSi(NMe2)2Cl, CH3(H)Si(NMe2)Cl, (CH3)2Si(NMe2)Cl, CH2CH(CH3)Si(NMe2)Cl, and Ph2Si(NMe2)Cl. Comparison of the spectra of these compounds with those in the perhalo and peramine series showed that replacement of NMe2 for Cl resulted in an upfield shift of the resonances of the other groups linked to silicon, a shift which parallels that observed upon substitution of CH3 for Cl. The relationship of ν(SiH) in the IR and δ(SiH) in the NMR spectra was linear.
