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Usage

Uses

Used in Flame Retardant Industry:
TETRABROMOBISPHENOL A DIMETHYL ETHER is used as an additive for enhancing the flame retardancy of materials. Its application reason is to improve the fire safety of products by reducing their flammability and slowing down the spread of fire.
Used in Electronics Industry:
In the electronics industry, TETRABROMOBISPHENOL A DIMETHYL ETHER is used as a flame retardant in the production of printed circuit boards (PCBs) and other electronic components. The application reason is to ensure the safety of electronic devices by reducing the risk of fire caused by electrical faults or overheating.
Used in Construction and Building Materials:
TETRABROMOBISPHENOL A DIMETHYL ETHER is also used in the construction and building materials industry as a flame retardant in materials such as insulation, plastics, and textiles. The application reason is to provide additional fire protection for buildings and structures, reducing the risk of fire-related damage and casualties.
Used in Textile Industry:
In the textile industry, TETRABROMOBISPHENOL A DIMETHYL ETHER is used as a flame retardant in the production of various fabrics and textiles. The application reason is to create fire-resistant materials that can be used in applications such as upholstery, curtains, and other home furnishings, as well as in specialized protective clothing for firefighters and other emergency responders.

Upstream product

• 79-94-7 Tetrabromobisphenol A 
• 74-88-4 methyl iodide 

Relevant academic research and scientific papers

Microbial O-methylation of the flame retardant tetrabromobisphenol-A

We demonstrated the O-methylation of tetrabromobisphenol-A (TBBPA) [4,4′-isopropylidenebis (2,6-dibromophenol)] to its mono- and dimethyl ether derivatives by microorganisms present in different sediments. A most probable number assay of a marsh sediment suggested that up to 10% of the total aerobic heterotrophs may be capable of O-methylation. Although TBBPA dimethyl ether is not produced in industry, it has been detected in terrestrial and aquatic sediments. Our study supports the hypothesis that TBBPA dimethyl ether is a product of microbial O-methylation. The O-methylation of TBBPA, as well as its analog, tetrachlorobisphenol-A (TCBPA), was also demonstrated in cultures of two chlorophenol-metabolizing bacteria, Mycobacterium fortuitum CG-2 and Mycobacterium chlorophenolicum PCP-I. These strains also mediated the O-methylation of 2,6-dibromophenol and 2,6-dichlorophenol, analogs of TBBPA and TCBPA, to their corresponding anisoles, but 2,6-fluorophenol was not transformed. Due to the addition of hydrophobic methyl groups, O-methylated derivatives are more lipophilic, increasing the probability of bioaccumulation in the food chain. Future research regarding the toxicological effects of the O-methylated derivatives of TBBPA is recommended and will further elucidate potential risks to environmental and human health.

Realization of both high hydrogen selectivity and capacity in a guest responsive metal-organic framework

Two newly designed semi-flexible tetratopic carboxylate ligands, 5′,5′′′′-(propane-2,2-diyl)bis(2′-methoxy- [1,1′:3′,1′′-terphenyl]-4,4′′-dicarboxylate) (pbtd-OMe4-) and 5′,5′′′′-(propane-2, 2-diyl)bis(2′-ethoxy-[1,1′:3′,1′′-terphenyl]-4, 4′′-dicarboxylate) (pbtd-OEt4-), have been used to connect dicopper paddlewheel building units to afford two isostructural metal-organic frameworks, Cu2(H2O)2(pbtd-OR) ·xS (R = Me, PCN-38·xS; R = Et, PCN-39·xS, S represents noncoordinated guest molecules, PCN = porous coordination network) with novel structure and gas sorption properties upon activation. PCN-39 undergoes structural transformations upon guest solvent removal, leading to observation of distinct phases from in situ powder X-ray diffraction measurements, and exhibits selective adsorption of H2 (up to 2.0 wt%) over CO, CO 2, and N2, which can be explained by optimized space-filling of the pendant ethoxy group. PCN-38 undergoes no transformation upon activation and exhibits hydrogen uptake up to 2.2 wt%, as well as moderate uptake of other gases. The selective adsorption of hydrogen over other gases highlights the potential application of PCN-39 in industrially important gas separation. The Royal Society of Chemistry 2013.

Preparation method for simultaneously synthesizing tetrabromobisphenol A monomethyl ether and dimethyl ether

The invention relates to a preparation method for simultaneously synthesizing tetrabromobisphenol A monomethyl ether and dimethyl ether. The preparation method comprises the steps: dissolving TBBPA into acetonitrile; deprotonating with sodium hydroxide, adding methyl iodide, heating to perform methylation reaction, cooling in an ice bath after the reaction is finished, dissolving and cleaning withdichloromethane, filtering, dewatering and concentrating to obtain a concentrated solution, and separating and purifying the concentrated solution by adopting medium-pressure preparative chromatography to obtain tetrabromobisphenol A monomethyl ether and tetrabromobisphenol A dimethyl ether simultaneously. Monomethyl ether and dimethyl ether of TBBPA can be obtained at the same time only throughone-step reaction, and especially the high yield of monomethyl ether is guaranteed; meanwhile, the post-treatment steps are simplified, and losses caused by multiple times of extraction in an existingmethod are avoided; the medium-pressure preparative chromatography adopts silica gel column chromatography, is suitable for purification of constant samples, can accurately separate components in theproduct through real-time control, and ensures the purity of the product.

Method for preparing molecular glass photoresist containing bisphenol A skeletal structure

The invention relates to a method for preparing a molecular glass photoresist containing a bisphenol A skeletal structure. A solvent is used for washing and filtering to purify a product to replace asilica gel column to purify the product, post-processing complexity is greatly reduced, post-processing time is reduced, and production personnel can be prevented from hazards caused by silica gel. Inaddition, the method can greatly improve the yields of compounds (III) and (V) while keeping the purity unchanged: the yield from a compound (I) to the compound (III) is improved by 15% or more, andthe yield of a compound (IV) to the compound (V) is improved by 25% or more.

Molecular glass photoresists containing bisphenol a framework and method for preparing the same and use thereof

The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated with a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives into a positive or negative photoresist. A photoresist with a uniform thickness is formed on a silicon wafer by spin-coating. The photoresist formulation can be used in modern lithography, such as 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, electron beam lithography, and particularly in the EUV-lithography technique.