41580-58-9

Usage

General Description

N-Hydroxyphthalimide triflate, 99+%, ELE is a chemical compound that is widely used in organic synthesis as a mild and selective oxidizing reagent. It is often utilized as a precursor for the synthesis of various organic compounds, including pharmaceuticals, agrochemicals, and functional materials. N-HYDROXYPHTHALIMIDE TRIFLATE, 99+%, ELE is known for its high purity, making it suitable for a wide range of research and industrial applications. Additionally, its triflate moiety provides improved stability and reactivity, making it a valuable reagent in numerous chemical transformations.

Downstream Products

• 33067-24-2 Phenyl-N-phenoxycarbonylanthranilat 
• 41580-61-4 S-Phenyl-2-(S-phenylthiocarbamyl)thiobenzoat 
• 520-03-6 N-phenylphthalimide 

Relevant academic research and scientific papers

Novel anthracene derivative and radiation-sensitive resin composition

A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition

A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Z1 and Z2 are individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

Novel carbazole derivative and chemically amplified radiation-sensitive resin composition

A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.