41580-58-9

Basic information

• Product Name: N-HYDROXYPHTHALIMIDE TRIFLATE, 99+%, ELE
• Synonyms: N-HYDROXYPHTHALIMIDE TRIFLATE, 99+%, ELE;N-Hydroxyphthalimide triflate;N-Hydroxyphthalimide trifluoromethanesulfonate;1H-Isoindole-1,3(2H)-dione, 2-[[(trifluoroMethyl)sulfonyl]oxy]-
• CAS NO: 41580-58-9
• Molecular Formula: C₉H₄F₃NO₅S
• Molecular Weight: 295.19
• Mol File: 41580-58-9.mol
• Article Data: 3

Chemical Properties

• Boiling Point: 351.3±52.0 °C(Predicted)
• Appearance: /
• Density: 1.81±0.1 g/cm3(Predicted)
• CAS DataBase Reference: N-HYDROXYPHTHALIMIDE TRIFLATE, 99+%, ELE(CAS DataBase Reference)
• NIST Chemistry Reference: N-HYDROXYPHTHALIMIDE TRIFLATE, 99+%, ELE(41580-58-9)
• EPA Substance Registry System: N-HYDROXYPHTHALIMIDE TRIFLATE, 99+%, ELE(41580-58-9)

Safety Data

• Hazardous Substances Data: 41580-58-9(Hazardous Substances Data)

Usage

General Description

N-Hydroxyphthalimide triflate, 99+%, ELE is a chemical compound that is widely used in organic synthesis as a mild and selective oxidizing reagent. It is often utilized as a precursor for the synthesis of various organic compounds, including pharmaceuticals, agrochemicals, and functional materials. N-HYDROXYPHTHALIMIDE TRIFLATE, 99+%, ELE is known for its high purity, making it suitable for a wide range of research and industrial applications. Additionally, its triflate moiety provides improved stability and reactivity, making it a valuable reagent in numerous chemical transformations.

Downstream Products

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Relevant articles and documents

Novel anthracene derivative and radiation-sensitive resin composition

A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

Novel carbazole derivative and chemically amplified radiation-sensitive resin composition

A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.