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42201-98-9

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42201-98-9 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 42201-98-9 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 4,2,2,0 and 1 respectively; the second part has 2 digits, 9 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 42201-98:
(7*4)+(6*2)+(5*2)+(4*0)+(3*1)+(2*9)+(1*8)=79
79 % 10 = 9
So 42201-98-9 is a valid CAS Registry Number.

42201-98-9Relevant articles and documents

Activation of SF6 at Platinum Complexes: Formation of SF3 Derivatives and Their Application in Deoxyfluorination Reactions

Berg, Claudia,Braun, Thomas,Ahrens, Mike,Wittwer, Philipp,Herrmann, Roy

supporting information, p. 4300 - 4304 (2017/04/04)

The activation of SF6 at [Pt(PR3)2] R=Cy, iPr complexes in the presence of PR3 led selectively and in an unprecedented reaction route to the generation of the SF3 complexes trans-[Pt(F)(SF3)(PR3)2]. These can also be synthesized from SF4 and the SF2 derivative trans-[Pt(F)(SF2)(PCy3)2][BF4] was characterized by X-ray crystallography. trans-[Pt(F)(SF3)(PR3)2] complexes are useful tools for deoxyfluorination reactions and novel fluorido complexes bearing a SOF ligand are formed. Based on these studies a process for the deoxyfluorination of ketones was developed with SF6 as fluorinating agent.

Preparation of organohalosilanes

-

, (2008/06/13)

In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphine chalcogenide compound. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.

A Single-Crystal ESR and Quantum Chemical Study of Electron-Capture Trialkylphosphine Sulfide and Selenide Radical Anions with a Three-Electron Bond

Janssen, Rene A. J.,Kingma, Joost A. J. M.,Buck, Henk M.

, p. 3018 - 3026 (2007/10/02)

A low-temperature ESR study of electron-capture phosphoranyl radicals in X-irradiated single crystals of trialkylphosphine sulfides and selenides (R3PX: X=S, Se; R=CH3, C2H5, C6H11) is presented.The principal values and direction cosines of the g tensors

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