4364-07-2

Basic information

• Product Name: 1,4-DISILABUTANE
• Synonyms: 1,4-DISILABUTANE;1,2-ETHANEDIYLBISSILANE
• CAS NO: 4364-07-2
• Molecular Formula: C₂H₁₀Si₂
• Molecular Weight: 90.27
• Mol File: 4364-07-2.mol
• Article Data: 4

Chemical Properties

• Melting Point: -15°C
• Boiling Point: 45-46°C
• Flash Point: -31°'C (-24°F)
• Appearance: /
• Density: 0,697 g/cm3
• Refractive Index: 1.4141
• CAS DataBase Reference: 1,4-DISILABUTANE(CAS DataBase Reference)
• NIST Chemistry Reference: 1,4-DISILABUTANE(4364-07-2)
• EPA Substance Registry System: 1,4-DISILABUTANE(4364-07-2)

Safety Data

• Hazard Codes: F
• Statements: 5
• Safety Statements: 16-36
• RIDADR: UN 1993 3/PG 1
• TSCA: No
• Hazardous Substances Data: 4364-07-2(Hazardous Substances Data)

Usage

General Description

1,4-DISILABUTANE is a chemical compound with the molecular formula C6H18Si2. It is a colorless, odorless liquid that is insoluble in water but soluble in organic solvents. 1,4-DISILABUTANE is primarily used as a building block in the synthesis of siloxane polymers and silicones. It is also utilized as a coupling agent, crosslinker, and surface modifier in various industrial applications. The compound is considered to have low toxicity and is relatively stable under normal conditions, making it suitable for use in a wide range of industries, including cosmetics, personal care products, and pharmaceuticals. Additionally, 1,4-DISILABUTANE is used as a reagent in chemical research and can serve as a precursor to other organosilicon compounds.

Upstream product

• 2504-64-5 1,2-bis(trichlorosilyl)ethane 
• 16853-85-3 lithium aluminium tetrahydride 
• 7570-21-0 (bromomethyl)silane 

Downstream Products

• 74-85-1 ethene 
• 7291-09-0 vinylsilane 
• 74-86-2 acetylene 
• 16068-37-4 1,2-bis(triethoxysilyl)ethane 
• 18406-41-2 1,2-bis(trimethoxysilyl)-ethane 

Relevant articles and documents

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Reaction of Hydrogen Peroxide with Organosilanes under Chemical Vapour Deposition Conditions

When a stream of vapour at low pressure which contained a mixture of H2O2 with an organosilane, RSiH3 (R = alkyl or alkenyl), impinged on a silicon wafer, deposition of oxide films of nominal composition RxSiO(2-0.5x), where x 3 or higher alkenyl groups. or higher alkenylgroups. Possible mechanism for the Si-C bond cleavage reaction are discussed, with energetic rearrangement of radical intermediates of type Si(H)(R)(OOH)' being favoured.

Synthetic Pathways to Simple Di- and Trisilylmethanes: Potential Starting Materials for the CVD Deposition of Amorphous Silicon a-SiC:H

Methods for the preparation of simple silaalkanes with a high content of silicon and hydrogen have been explored.Target molecules, like H3SiCH2SiH3 and HC(SiH3)3, may serve as precursor molecules for the production of photovoltaic elements through thermal or discharge (plasma) CVD processes.Among a variety of synthetic pathways, the reactions between HSiCl3 and HCCl3 in the presence of an amine (Benkeser reaction) and the direct synthesis from silicon and polychloromethanes proved most promising for large scale preparations.The CH2X2/KSiH3 metathesis is most useful on the laboratory scale. - The Grignard synthesis was employed for partly methylated homologues, like H3SiCH2SiH2CH3, H3SiCH2SiH(CH3)2, H3SiCH2Si(CH3)3, and related molecules.The magnesium reduction of CHBr3/SiCl4 and CHBr3/CH3SiCl3 mixtures serves best for the preparation of HC(SiCl3)3, which can be converted into HC(SiH3)3 using LiAlH4.Attempts to synthesize tetrasilylmethane via the same route, C(SiH3)4, led only to the formation of HC(SiH3)3. - Key words: Amorphous Silicon a-SiC:H, Disilylmethane, Trisilylmethane, Direct Synthesis, Polysilylmethanes