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Ethene, also known as ethylene, is a colorless, flammable gas with a sweet odor. It is the simplest alkene and is widely used in the production of polyethylene, the most common plastic in the world. Ethene is also utilized in the synthesis of various chemicals such as ethanol, ethylene oxide, and ethylene dichloride. It is produced in large quantities by steam cracking of hydrocarbons and is also a natural plant hormone, playing a role in the ripening and aging of fruits. Ethene is an important industrial chemical with a wide range of applications in various industries including agriculture, packaging, and manufacturing.

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  • 74-85-1 Structure
  • Basic information

    1. Product Name: Ethene
    2. Synonyms: Acetene;Athylen;Bicarburretted hydrogen;Elayl;Etileno;HSDB 168;Liquid ethylene;Olefiant gas;UNII-91GW059KN7;Ethylene, pure;
    3. CAS NO:74-85-1
    4. Molecular Formula: C2H4
    5. Molecular Weight: 28.05316
    6. EINECS: 200-815-3
    7. Product Categories: N/A
    8. Mol File: 74-85-1.mol
    9. Article Data: 2860
  • Chemical Properties

    1. Melting Point: -169℃
    2. Boiling Point: -103.7 °C (169.5 K, -154.7 °F)
    3. Flash Point: -136 °C
    4. Appearance: Colourless gas
    5. Density: 0.482 g/cm3
    6. Refractive Index: N/A
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. CAS DataBase Reference: Ethene(CAS DataBase Reference)
    10. NIST Chemistry Reference: Ethene(74-85-1)
    11. EPA Substance Registry System: Ethene(74-85-1)
  • Safety Data

    1. Hazard Codes:  F+:Highly flammable;
    2. Statements: R12:; R67:;
    3. Safety Statements: S9:; S16:; S33:; S46:;
    4. RIDADR: 1962
    5. WGK Germany:
    6. RTECS:
    7. HazardClass: 2.1
    8. PackingGroup: N/A
    9. Hazardous Substances Data: 74-85-1(Hazardous Substances Data)

74-85-1 Usage

Uses

Used in Plastics Industry:
Ethene is used as a monomer for the production of polyethylene, which is the most common plastic in the world. Polyethylene is used in a wide range of applications, including packaging materials, plastic films, bottles, and containers.
Used in Chemical Synthesis:
Ethene is used as a raw material in the synthesis of various chemicals, such as ethanol, ethylene oxide, and ethylene dichloride. These chemicals are used in the production of a wide range of products, including solvents, detergents, and other industrial chemicals.
Used in Agriculture:
Ethene is used as a natural plant hormone to regulate the ripening and aging of fruits. It is applied in the agriculture industry to control the ripening process of fruits, ensuring optimal taste and quality.
Used in Packaging Industry:
Ethene is used in the production of polyethylene films and containers, which are widely used in the packaging industry for food, beverages, and other consumer products. These packaging materials provide protection, preservation, and convenience for the products.
Used in Manufacturing Industry:
Ethene is used as a key component in the manufacturing of various products, such as automotive parts, electrical components, and construction materials. Its versatility and properties make it an essential raw material in the manufacturing process.

Check Digit Verification of cas no

The CAS Registry Mumber 74-85-1 includes 5 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 2 digits, 7 and 4 respectively; the second part has 2 digits, 8 and 5 respectively.
Calculate Digit Verification of CAS Registry Number 74-85:
(4*7)+(3*4)+(2*8)+(1*5)=61
61 % 10 = 1
So 74-85-1 is a valid CAS Registry Number.
InChI:InChI=1/C2H4/c1-2/h1-2H2

74-85-1 Well-known Company Product Price

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  • Aldrich

  • (536164)  Ethylene  99.99%

  • 74-85-1

  • 536164-110G

  • 9,605.70CNY

  • Detail
  • Sigma-Aldrich

  • (03482)  Ethylene  purum, ≥99.9%

  • 74-85-1

  • 03482-700G

  • 5,955.30CNY

  • Detail
  • Sigma-Aldrich

  • (03484)  Ethylene  ≥99.9%

  • 74-85-1

  • 03484-3.2KG

  • 23,318.10CNY

  • Detail

74-85-1SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 16, 2017

Revision Date: Aug 16, 2017

1.Identification

1.1 GHS Product identifier

Product name ethene

1.2 Other means of identification

Product number -
Other names Ethen

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Fuels and fuel additives,Intermediates,Processing aids, specific to petroleum production
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:74-85-1 SDS

74-85-1Synthetic route

ethanol
64-17-5

ethanol

ethene
74-85-1

ethene

Conditions
ConditionsYield
With mesoporous silica MCM-4l/Al at 399.84℃; under 21.0021 - 94.5095 Torr; for 50h; Inert N2;100%
With H-USY zeolite at 299.84℃; under 760.051 Torr; for 1.5h; Catalytic behavior; Reagent/catalyst; Time; Temperature; Inert atmosphere; Flow reactor;100%
With water at 380℃; under 1500.15 Torr; Reagent/catalyst;99%
oxirane
75-21-8

oxirane

dipropylphosphinous iodide
81373-58-2

dipropylphosphinous iodide

A

ethene
74-85-1

ethene

B

2-iodoethyl dipropylphosphinate

2-iodoethyl dipropylphosphinate

Conditions
ConditionsYield
In dichloromethane for 1h; Yields of byproduct given;A n/a
B 100%
oxirane
75-21-8

oxirane

iodo-diphenyl-phosphine
20472-52-0

iodo-diphenyl-phosphine

A

ethene
74-85-1

ethene

B

2-iodoethyl diphenylphosphinate

2-iodoethyl diphenylphosphinate

Conditions
ConditionsYield
In dichloromethane for 1h; Yields of byproduct given;A n/a
B 100%
5-cyclopentylidene-2,2-dimethyl-1,3-dioxane-4,6-dione
3968-30-7

5-cyclopentylidene-2,2-dimethyl-1,3-dioxane-4,6-dione

A

butatriene
2873-50-9

butatriene

B

ethene
74-85-1

ethene

C

carbon dioxide
124-38-9

carbon dioxide

D

cyclohexa-1,3-diene
1165952-91-9

cyclohexa-1,3-diene

E

acetone
67-64-1

acetone

F

benzene
71-43-2

benzene

Conditions
ConditionsYield
With variation of temp. at 550℃; Product distribution;A 4%
B 11.9%
C 100%
D 39.2%
E 101.9 %
F 3.3%
diallyl sulphide
592-88-1

diallyl sulphide

A

2,5-dihydro-thiophene
1708-32-3

2,5-dihydro-thiophene

B

ethene
74-85-1

ethene

Conditions
ConditionsYield
With tungsten In octane; chlorobenzene at 80℃; for 1h;A 100%
B n/a
With chloroaryloxide neopentylidene complex of tungsten (1)A 90%
B n/a
(2,6-Ph2C6H3O)2W(Cl)=CHC(CH3)3*OEt2 In chlorobenzene at 80℃; for 3h;A 88%
B n/a
phenyl propionate
637-27-4

phenyl propionate

A

ethene
74-85-1

ethene

B

pentan-3-one
96-22-0

pentan-3-one

C

phenol
108-95-2

phenol

Conditions
ConditionsYield
With bis(1,5-cyclooctadiene)nickel (0); triphenylphosphine at 54℃; for 20h; Product distribution; Rate constant; Thermodynamic data; other solvents, reagents, reagents ratio, time, temperature; activation energy, ΔH<*>, ΔS<*>;A 100%
B n/a
C 100%
ethenyltrimethylsilane
754-05-2

ethenyltrimethylsilane

ethene
74-85-1

ethene

Conditions
ConditionsYield
With trifluoroacetic acid at 120℃;100%
Allyl ether
557-40-4

Allyl ether

A

2,5-dihydrofuran
1708-29-8

2,5-dihydrofuran

B

ethene
74-85-1

ethene

Conditions
ConditionsYield
With tungsten In octane; chlorobenzene at 80℃; for 2h;A 100%
B n/a
With Grubbs catalyst first generation In dichloromethane
3-allylsulfanyl-2-methyl-propene
83044-85-3

3-allylsulfanyl-2-methyl-propene

A

3-methyl-2,5-dihydro-thiophene
42855-50-5

3-methyl-2,5-dihydro-thiophene

B

ethene
74-85-1

ethene

Conditions
ConditionsYield
With tungsten In octane; chlorobenzene at 80℃; for 1h;A 100%
B n/a
2-phenylethanol
60-12-8

2-phenylethanol

ethenyltrimethylsilane
754-05-2

ethenyltrimethylsilane

A

ethene
74-85-1

ethene

B

trimethyl(phenethyloxy)silane
14629-58-4

trimethyl(phenethyloxy)silane

Conditions
ConditionsYield
hydrogenchloride; chlorobis(ethylene)rhodium(I) dimer In 1,4-dioxane; chloroform at 20℃; for 2h; Product distribution / selectivity;A n/a
B 100%
chlorobis(cyclooctene)rhodium(I) dimer In toluene at 70℃; for 3h; Product distribution / selectivity;A n/a
B 100%
hydrogenchloride; chlorobis(cyclooctene)rhodium(I) dimer In 1,4-dioxane; chloroform at 20℃; for 2h; Product distribution / selectivity;A n/a
B 96%
ethanol
64-17-5

ethanol

dimethylphenylvinylsilane
1125-26-4

dimethylphenylvinylsilane

A

ethene
74-85-1

ethene

B

dimethyl(ethoxy)phenylsilane
1825-58-7

dimethyl(ethoxy)phenylsilane

Conditions
ConditionsYield
hydrogenchloride; chlorobis(cyclooctene)rhodium(I) dimer In 1,4-dioxane; chloroform at 20℃; for 18h; Kinetics;A n/a
B 100%
isopropyl alcohol
67-63-0

isopropyl alcohol

dimethylphenylvinylsilane
1125-26-4

dimethylphenylvinylsilane

A

ethene
74-85-1

ethene

B

dimethyl(isopropoxy)phenylsilane
17988-21-5

dimethyl(isopropoxy)phenylsilane

Conditions
ConditionsYield
hydrogenchloride; chlorobis(cyclooctene)rhodium(I) dimer In 1,4-dioxane; chloroform at 20℃; for 24h; Kinetics;A n/a
B 100%
tris(1,10-phenanthroline)iron(III)
13479-49-7

tris(1,10-phenanthroline)iron(III)

cis-{(C2H5)2Co(2,2'-bipyridine)2}(ClO4)

cis-{(C2H5)2Co(2,2'-bipyridine)2}(ClO4)

A

ethane
74-84-0

ethane

B

ethene
74-85-1

ethene

C

n-butane
106-97-8

n-butane

Conditions
ConditionsYield
With oxygen In acetonitrile byproducts: {Co(2,2'-bipyridine)2}(2+); one-electron oxidn. of cis-Co complex by (Fe(phen)3(3+) in presence of O2 at 298 K; monitored by (1)H-NMR;A <1
B <1
C 100%
In acetonitrile byproducts: {Co(2,2'-bipyridine)2}(2+); one-electron oxidn. of cis-Co complex by (Fe(phen)3(3+) at 298 K; monitored by (1)H-NMR;A <1
B <1
C 98%
tris(2,2'-bipyridine)iron(III) ion
18661-69-3

tris(2,2'-bipyridine)iron(III) ion

cis-{(C2H5)2Co(2,2'-bipyridine)2}(ClO4)

cis-{(C2H5)2Co(2,2'-bipyridine)2}(ClO4)

A

ethane
74-84-0

ethane

B

ethene
74-85-1

ethene

C

n-butane
106-97-8

n-butane

Conditions
ConditionsYield
In acetonitrile byproducts: {Co(2,2'-bipyridine)2}(2+); one-electron oxidn. of cis-Co complex by (Fe(bpy)3(3+) at 298 K; monitored by (1)H-NMR;A <1
B <1
C 100%
diethylbis(triethylphosphine)platinum(II)
75847-39-1, 76189-28-1

diethylbis(triethylphosphine)platinum(II)

A

(ethylene)bis(triethylphosphine)platinum(0)
76136-93-1

(ethylene)bis(triethylphosphine)platinum(0)

B

ethene
74-85-1

ethene

Conditions
ConditionsYield
In cyclohexane Pt-complex evacuated to 0.1 torr, flushed with Ar, dry degassed cyclohexane added, cooled (liq. N2), evacuated (0.1 torr), sealed, warmed to room temp., heated at 118°C (oil bath) for 30 min;A 100%
B 0%
bis(1,5-cyclooctadiene)nickel (0)
1295-35-8

bis(1,5-cyclooctadiene)nickel (0)

tetrakis(triphenylphosphine)nickel(0)
15133-82-1

tetrakis(triphenylphosphine)nickel(0)

A

nickel(II) propionate

nickel(II) propionate

B

(triphenylphosphine)3(CO)nickelk
15376-83-7

(triphenylphosphine)3(CO)nickelk

C

ethene
74-85-1

ethene

D

phenol
108-95-2

phenol

Conditions
ConditionsYield
With triphenylphosphine In neat (no solvent) (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and Ni(PPh3)4, mixture stirred at 54°C for 20 h; GLC;A 73%
B n/a
C 100%
D 91%
bis(1,5-cyclooctadiene)nickel (0)
1295-35-8

bis(1,5-cyclooctadiene)nickel (0)

phenyl propionate
637-27-4

phenyl propionate

A

(triphenylphosphine)3(CO)nickelk
15376-83-7

(triphenylphosphine)3(CO)nickelk

B

ethene
74-85-1

ethene

C

phenol
108-95-2

phenol

Conditions
ConditionsYield
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 10), mixture stirred at 54°C for 21 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane;A 80%
B 100%
C 100%
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 4),mixture stirred at 54°C for 20 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane;A 60%
B 100%
C 100%
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 3),mixture stirred at 54°C for 20 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane;A 60%
B 90%
C 90%
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 2),mixture stirred at 54°C for 12 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane;A 30%
B 60%
C 60%
With triphenylphosphine In neat (no solvent) Kinetics; byproducts: diethyl ketone, 1,3-cyclooctadiene, 1,4-cyclooctadiene; further byproducts: 1,5-cyclooctadiene, bicyclooctene-1, bicyclooctene-2, (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and PPh3 (PPh3/Ni = 1),mixture stirred at 54°C for 12 h; gas chromy., volatile removed in vac., recrystd. from THF-hexane;A n/a
B 40%
C 50%
bis(1,5-cyclooctadiene)nickel (0)
1295-35-8

bis(1,5-cyclooctadiene)nickel (0)

phenyl propionate
637-27-4

phenyl propionate

Tri(p-tolyl)phosphine
1038-95-5

Tri(p-tolyl)phosphine

A

ethene
74-85-1

ethene

B

Ni(CO)(P(C6H4CH3)3)3
74887-07-3

Ni(CO)(P(C6H4CH3)3)3

C

phenol
108-95-2

phenol

Conditions
ConditionsYield
In further solvent(s) Kinetics; (N2 or Ar or vac.), EtCOOPh added to Ni(cod)2 and P(C6H4CH3)3 (P(Ph-CH3)3/Ni = 3) in acetophenone, mixture stirred at 65°C for 50 h;A 80%
B 85%
C 100%
N,N-Diallyltosylamide
50487-72-4

N,N-Diallyltosylamide

A

ethene
74-85-1

ethene

B

1-[(4-methylphenyl)sulfonyl]-2,5-dihydro-1H-pyrrole
16851-72-2

1-[(4-methylphenyl)sulfonyl]-2,5-dihydro-1H-pyrrole

Conditions
ConditionsYield
With Hoveyda-Grubbs catalyst second generation In dichloromethane at 40℃; for 1h; Concentration; Solvent; Temperature; Grubbs Olefin Metathesis; Flow reactor;A n/a
B 100%
With Hoveyda-Grubbs catalyst second generation In (2)H8-toluene at 29.84℃; Reagent/catalyst;
1,3-dithiolane-2-thione
822-38-8

1,3-dithiolane-2-thione

dimethyl acetylenedicarboxylate
762-42-5

dimethyl acetylenedicarboxylate

A

4,5-bis(methoxycarbonyl)-1,3-dithiole-2-thione
7396-41-0

4,5-bis(methoxycarbonyl)-1,3-dithiole-2-thione

B

ethene
74-85-1

ethene

Conditions
ConditionsYield
at 120 - 140℃;A 99.6%
B n/a
ethylene dibromide
106-93-4

ethylene dibromide

ethene
74-85-1

ethene

Conditions
ConditionsYield
With triethylamine In water at 20℃; for 2h; Inert atmosphere; Irradiation;99%
With vanadocene In hexane Product distribution; vanadocene monobromide, vanadocene monochloride; other temperature and reaction time.;62%
Electrolysis;
2,2-diphenyl-1,3-dithiolane
6317-10-8

2,2-diphenyl-1,3-dithiolane

A

benzophenone
119-61-9

benzophenone

B

ethene
74-85-1

ethene

Conditions
ConditionsYield
In chlorobenzene for 24h; Heating;A 99%
B n/a
7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid diisopropyl ester dimethyl ester
85597-87-1

7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid diisopropyl ester dimethyl ester

A

ethene
74-85-1

ethene

B

1H-Pyrrole-2,3,4,5-tetracarboxylic acid diisopropyl ester dimethyl ester
85597-95-1

1H-Pyrrole-2,3,4,5-tetracarboxylic acid diisopropyl ester dimethyl ester

Conditions
ConditionsYield
at 90 - 120℃; for 3h;A n/a
B 99%
ethanol
64-17-5

ethanol

A

diethyl ether
60-29-7

diethyl ether

B

ethene
74-85-1

ethene

Conditions
ConditionsYield
With alumina at 449.84℃; Catalytic behavior; Reagent/catalyst; Temperature; Inert atmosphere; Overall yield = 100 %;A 0.1%
B 98.9%
C2I2O2Rh(1-)*C8H20N(1+); tetraethylammonium iodide; hydrogen iodide In water at 110℃; Product distribution / selectivity; Inert atmosphere; Autoclave;A 10%
B 50%
1-methyl-3-(propyl-3-sulfonyl)imidazolium trifluoromethanesulfonate; CF3O3S(1-)*CHF3O3S*C7H13N2O3S(1+) at 240 - 260℃; for 4h; Product distribution / selectivity;A n/a
B 12%
methane
34557-54-5

methane

ethene
74-85-1

ethene

Conditions
ConditionsYield
under 760.051 Torr; Recess waveguide; Gas phase;98.53%
With hydrogen under 760.051 Torr; Product distribution / selectivity; Microwave irradiation;96.4%
Stage #1: methane
Stage #2: With alumina at 125℃; Reagent/catalyst; Temperature;
55%
ethane
74-84-0

ethane

ethene
74-85-1

ethene

Conditions
ConditionsYield
With oxygen; V-Mo-Nb-Te oxide98%
at 800℃; under 760.051 Torr; for 1h; Catalytic behavior; Gas phase; Flow reactor;84%
With disulfur; iron(II,III) oxide at 940℃; Reagent/catalyst; Temperature; Flow reactor;75.9%
methane
34557-54-5

methane

A

propene
187737-37-7

propene

B

ethene
74-85-1

ethene

Conditions
ConditionsYield
With iron sulfide at 800 - 900℃; other metal sulfides;A 2%
B 98%
With SAPO-34/HZSM-5 nanostructure In water at 370℃; for 20h; Reagent/catalyst; Inert atmosphere;
7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid tetramethyl ester
85597-84-8

7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid tetramethyl ester

A

ethene
74-85-1

ethene

B

tetramethyl 1H-pyrrole-2,3,4,5-tetracarboxylate
2703-15-3

tetramethyl 1H-pyrrole-2,3,4,5-tetracarboxylate

Conditions
ConditionsYield
at 90 - 120℃; for 3h;A n/a
B 98%
7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid di-tert-butyl ester dimethyl ester
85597-90-6

7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid di-tert-butyl ester dimethyl ester

A

ethene
74-85-1

ethene

B

1H-Pyrrole-2,3,4,5-tetracarboxylic acid di-tert-butyl ester dimethyl ester
85597-98-4

1H-Pyrrole-2,3,4,5-tetracarboxylic acid di-tert-butyl ester dimethyl ester

Conditions
ConditionsYield
at 90 - 120℃; for 3h;A n/a
B 98%
7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid dicyclohexyl ester dimethyl ester
85597-92-8

7-Aza-bicyclo[2.2.1]hept-2-ene-1,2,3,4-tetracarboxylic acid dicyclohexyl ester dimethyl ester

A

ethene
74-85-1

ethene

B

1H-Pyrrole-2,3,4,5-tetracarboxylic acid dicyclohexyl ester dimethyl ester
85598-00-1

1H-Pyrrole-2,3,4,5-tetracarboxylic acid dicyclohexyl ester dimethyl ester

Conditions
ConditionsYield
at 90 - 120℃; for 3h;A n/a
B 98%
ethene
74-85-1

ethene

1-hexene
592-41-6

1-hexene

Conditions
ConditionsYield
With trimethylamine-N-oxide; [N(4-C6H4Br)3][B(C6F5)4]; triethylaluminum; [Cr(CO)4(2-C6H4(MeO))2PN(Me)P(2-C6H4(MeO))2] In toluene at 60℃; under 30002.4 Torr; for 1h;100%
In chlorobenzene at 45℃; under 36201.3 Torr; for 4h; Product distribution / selectivity;99%
In chlorobenzene at 60℃; under 36201.3 Torr; for 4h; Product distribution / selectivity;99%
ethene
74-85-1

ethene

ethane
74-84-0

ethane

Conditions
ConditionsYield
With hydrogen; [Ru2(μ-O2C-C6H4-CO2)2] at 20℃; for 5.4h; Kinetics; Product distribution; Further Variations:; Catalysts; reaction times;100%
With [1,1-(1,3-dimethylimidazol-2-ylidene)(PPh3)-3-(Py)-1,2-RhSB9H8]; hydrogen In dichloromethane-d2 under 3750.38 Torr; for 12h; Catalytic behavior; Time; Inert atmosphere;73%
With hydrogen; palladium25%
ethene
74-85-1

ethene

bis(2-chloroethyl)selenium dichloride
106471-36-7

bis(2-chloroethyl)selenium dichloride

Conditions
ConditionsYield
With selenium tetrachloride In benzene100%
With tetrachlorosilane; chloroform
With diselenium dichloride; benzene
ethene
74-85-1

ethene

acetaldehyde
75-07-0

acetaldehyde

Conditions
ConditionsYield
With bis(benzonitrile)palladium(II) dichloride; py.Co(N,N'-bis(alicylidene-o-phenylene)diamino).NO2 In tetrahydrofuran at 50℃; under 760 Torr; for 0.916667h;100%
With bis(benzonitrile)palladium(II) dichloride; py.Co(N,N'-bis(alicylidene-o-phenylene)diamino).NO2 In tetrahydrofuran at 50℃; under 760 Torr; for 0.916667h; Product distribution; influence of Pd/Co ratio, solvent, further olefins;100%
With aluminum(III) sulfate; water at 350 - 360℃;
styrene
292638-84-7

styrene

ethene
74-85-1

ethene

3-phenylbut-1-ene
934-10-1

3-phenylbut-1-ene

Conditions
ConditionsYield
With silver trifluoromethanesulfonate; triphenylphosphine; bi(allylnickel bromide) In dichloromethane at -55℃; under 760 Torr; for 2h;100%
With bi(allylnickel bromide); silver trifluoromethanesulfonate; triphenylphosphine In dichloromethane at -55℃; under 760 Torr; for 2h; Addition; Hydrovinylation;95%
With 2; diethylaluminium chloride; triphenylphosphine In dichloromethane; toluene under 7500.6 Torr; for 0.5h;90%
ethene
74-85-1

ethene

Bis(trifluoromethyl)disulfid
372-64-5

Bis(trifluoromethyl)disulfid

1,2-Bis-trifluormethyl-mercapto-ethan
674-64-6

1,2-Bis-trifluormethyl-mercapto-ethan

Conditions
ConditionsYield
Irradiation (UV/VIS); 44 h;100%
Irradiation (UV/VIS); 44 h;100%
Irradiation;
ethene
74-85-1

ethene

1,4-Dithia-7-azanorbornylium hexafluoroarsenate
106726-64-1

1,4-Dithia-7-azanorbornylium hexafluoroarsenate

Conditions
ConditionsYield
With dithionitronium hexafluoroarsenate In liquid sulphur dioxide Ambient temperature;100%
With dithionitronium hexafluoroarsenate In liquid sulphur dioxide for 1h; Ambient temperature;100%
ethene
74-85-1

ethene

carbon monoxide
201230-82-2

carbon monoxide

di-n-propylamine
142-84-7

di-n-propylamine

tri-n-propylamine
102-69-2

tri-n-propylamine

Conditions
ConditionsYield
di(rhodium)tetracarbonyl dichloride In ethanol at 115℃; under 37503 Torr; for 1.5h;100%
ethene
74-85-1

ethene

4-ethoxyphenylacetic acid chloride
10368-35-1

4-ethoxyphenylacetic acid chloride

6-ethoxy-3,4-dihydro-2(1H)-naphthalenone
69788-78-9

6-ethoxy-3,4-dihydro-2(1H)-naphthalenone

Conditions
ConditionsYield
With aluminium trichloride In dichloromethane for 4h; Ambient temperature;100%
ethene
74-85-1

ethene

polyethylene

polyethylene

Conditions
ConditionsYield
With triphenylphosphine; bis(1,5-cyclooctadiene)nickel (0) In toluene at 25℃; under 22502.3 Torr; for 70h;100%
With tetramethyldialuminoxane; N,N'-(1,1-Me2-ethylene)bis(salicylideneaminato)Zr(IV)Cl2*THF In toluene at 25℃; under 7500.6 Torr; for 24h; Polymerization;
Pd-2 at 22℃; under 4137.18 Torr; for 12h; Polymerization;
ethene
74-85-1

ethene

3-acetoxy-3-(4-methoxyphenyl)prop-1-yne
99520-55-5

3-acetoxy-3-(4-methoxyphenyl)prop-1-yne

acetic acid 1-(4-methoxy-phenyl)-2-methylene-but-3-enyl ester

acetic acid 1-(4-methoxy-phenyl)-2-methylene-but-3-enyl ester

Conditions
ConditionsYield
With RuCl2(P(C6H11)3)(1,3-dimesityl-4,5-dihydroimidazol-2-ylidene)(=CHC6H5) In toluene at 80℃; under 760 Torr; for 0.5h;100%
With tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃; under 760.051 Torr; for 0.5h;100%
ethene
74-85-1

ethene

acetic acid 5-phenylpent-2-ynyl ester

acetic acid 5-phenylpent-2-ynyl ester

acetic acid 2-methylene-3-phenethylbut-3-enyl ester

acetic acid 2-methylene-3-phenethylbut-3-enyl ester

Conditions
ConditionsYield
With RuCl2(P(C6H11)3)(1,3-dimesityl-4,5-dihydroimidazol-2-ylidene)(=CHC6H5) In toluene at 80℃; under 760 Torr; for 0.5h;100%
With tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃; under 760.051 Torr; for 2h;94%
ethene
74-85-1

ethene

(1S,4R,5S,6R)-5,6-Bis-prop-2-ynyloxy-bicyclo[2.2.1]hept-2-ene
441741-15-7

(1S,4R,5S,6R)-5,6-Bis-prop-2-ynyloxy-bicyclo[2.2.1]hept-2-ene

(4aS,4bR,8aS,9aR)-2,7-Divinyl-4a,4b,6,8a,9,9a-hexahydro-3H-4,5-dioxa-fluorene
441741-16-8

(4aS,4bR,8aS,9aR)-2,7-Divinyl-4a,4b,6,8a,9,9a-hexahydro-3H-4,5-dioxa-fluorene

Conditions
ConditionsYield
Grubbs catalyst first generation In dichloromethane at 20℃; for 4h;100%
Grubbs catalyst first generation In dichloromethane at 20℃; for 4h;53%
ethene
74-85-1

ethene

N-(cyclopentenylmethyl)-4-methyl-N-(prop-2-ynyl)benzenesulfonamide
477977-14-3

N-(cyclopentenylmethyl)-4-methyl-N-(prop-2-ynyl)benzenesulfonamide

2-(toluene-4-sulfonyl)-1,2,3,4,5,6-hexahydro-cyclohepta[c]pyrrole

2-(toluene-4-sulfonyl)-1,2,3,4,5,6-hexahydro-cyclohepta[c]pyrrole

Conditions
ConditionsYield
Cl2(PCy3)(N,N'-(Mes)2-imidazolidin-2-yl)Ru=CHC6H5 In dichloromethane under 760.051 Torr; for 26h; Heating;100%
ethene
74-85-1

ethene

8,8-dimethyl-4-phenyl-6,10-dioxa-spiro[4.5]deca-1,3-diene-1,2-dicarboxylic acid dimethyl ester
780755-05-7

8,8-dimethyl-4-phenyl-6,10-dioxa-spiro[4.5]deca-1,3-diene-1,2-dicarboxylic acid dimethyl ester

C22H26O6

C22H26O6

Conditions
ConditionsYield
In toluene at 100℃; for 192h; Diels-Alder reaction; ambient pressure;100%
ethene
74-85-1

ethene

Pentafluoroethyl iodide
354-64-3

Pentafluoroethyl iodide

1,1,1,2,2-pentafluoro-4-iodobutane
40723-80-6

1,1,1,2,2-pentafluoro-4-iodobutane

Conditions
ConditionsYield
With Vazo64100%
With triethyl phosphite71%
With hydrazine hydrate; copper (I) acetate In isopropyl alcohol at 30℃; under 22800 Torr; for 4h;69%
copper at 80℃; under 6000.6 - 7500.75 Torr; for 1.33333h; Product distribution / selectivity;
With VAZO 64 at 65 - 81℃; under 4897.34 - 8931.21 Torr; for 3h; Industry scale; Autoclave;97.3 %Chromat.
N-(1S)-[(2S)-2-((1R)-1-hydroxy-3-trimethylsilyl-2-propyn-1-yl)-4-pentenoyl]bornane-10,2-sultam

N-(1S)-[(2S)-2-((1R)-1-hydroxy-3-trimethylsilyl-2-propyn-1-yl)-4-pentenoyl]bornane-10,2-sultam

ethene
74-85-1

ethene

N-(1S)-[1-[(1S,2R)-2-hydroxy-3-(1-trimethylsilylethen-1-yl)-3-cyclopentenyl]carbonyl]bornane-10,2-sultam

N-(1S)-[1-[(1S,2R)-2-hydroxy-3-(1-trimethylsilylethen-1-yl)-3-cyclopentenyl]carbonyl]bornane-10,2-sultam

Conditions
ConditionsYield
tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃;100%
N-(1S)-[(2R,3R)-6-benzyloxy-3-hydroxy-2-allyl-hex-4-ynoyl]bornane-10,2-sultam

N-(1S)-[(2R,3R)-6-benzyloxy-3-hydroxy-2-allyl-hex-4-ynoyl]bornane-10,2-sultam

ethene
74-85-1

ethene

N-(1S)-[1-[(1R,2R)-2-hydroxy-3-(3-(benzyloxy)prop-1-en-2-yl)-3-cyclopentenyl]carbonyl]bornane-10,2-sultam

N-(1S)-[1-[(1R,2R)-2-hydroxy-3-(3-(benzyloxy)prop-1-en-2-yl)-3-cyclopentenyl]carbonyl]bornane-10,2-sultam

Conditions
ConditionsYield
tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃;100%
N-(1S)-[(2R,3R)-6-benzyloxy-3-triethylsilyloxy-2-propen-3-yl-hex-4-ynoyl]bornane-10,2-sultam

N-(1S)-[(2R,3R)-6-benzyloxy-3-triethylsilyloxy-2-propen-3-yl-hex-4-ynoyl]bornane-10,2-sultam

ethene
74-85-1

ethene

N-(1S)-[1-[(1R,2R)-2-triethylsilyloxy-3-(3-(benzyloxy)prop-1-en-2-yl)-3-cyclopentenyl]carbonyl]bornane-10,2-sultam

N-(1S)-[1-[(1R,2R)-2-triethylsilyloxy-3-(3-(benzyloxy)prop-1-en-2-yl)-3-cyclopentenyl]carbonyl]bornane-10,2-sultam

Conditions
ConditionsYield
tricyclohexylphosphine[1,3-bis(2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidine][benzylidene]ruthenium(II) dichloride In toluene at 80℃;100%

74-85-1Relevant articles and documents

Stable and selective electrochemical reduction of carbon dioxide to ethylene on copper mesocrystals

Chen, Chung Shou,Handoko, Albertus D.,Wan, Jane Hui,Ma, Liang,Ren, Dan,Yeo, Boon Siang

, p. 161 - 168 (2015)

Stable and selective electrochemical reduction of carbon dioxide to ethylene was achieved using copper mesocrystal catalysts in 0.1 M KHCO3. The Cu mesocrystal catalysts were facilely derived by the in situ reduction of a thin CuCl film during the first 200 seconds of the CO2 electroreduction process. At -0.99 V vs. RHE, the Faradaic efficiency of ethylene formation using these Cu mesocrystals was ~18× larger than that of methane and forms up to 81% of the total carbonaceous products. Control CO2 reduction experiments show that this selectivity towards C2H4 formation could not be replicated by using regular copper nanoparticles formed by pulse electrodeposition. High resolution transmission electron microscopy reveals the presence of both (100)Cu facets and atomic steps in the Cu mesocrystals which we assign as active sites in catalyzing the reduction of CO2 to C2H4. CO adsorption measurements suggest that the remarkable C2H4 selectivity could be attributed to the greater propensity of CO adsorption on Cu mesocrystals than on other types of Cu surfaces. The Cu mesocrystals remained active and selective towards C2H4 formation for longer than six hours. This is an important and industrially relevant feature missing from many reported Cu-based CO2 reduction catalysts.

Effects of thickness extension mode resonance oscillation of acoustic waves on catalytic and surface properties. IV. Activation of a Ag catalyst for ethanol decomposition by overtone resonance frequencies

Saito,Inoue

, p. 2040 - 2045 (2003)

The effects of resonance frequencies of acoustic waves on catalytic and surface properties were studied. The overtone resonance frequencies of 3.5, 10.8, and 17.9 MHz were applied to a 100 nm thick Ag catalyst deposited on a ferroelectric z-cut LiNbO3 crystal which generated thickness extension mode resonance oscillation (TERO). For ethanol decomposition, the TERO enhanced ethylene production without significant changes in acetaldehyde production for all the frequencies. The extent of catalyst activation strongly depended on the resonance frequency. In a low power region (1.0 W), it increased in the order 3.5 > 10.8 > 17.9 MHz. The activation energy for ethylene production decreased remarkably in the presence of TERO, the extent of which strongly depended on the frequency. Laser Doppler measurements showed that with increasing resonance frequency, the number of standing waves increased markedly, whereas the amplitudes of the wave decreased considerably. The specific catalytic activity, defined as the activity enhancement per the density of wave, increased in a nonlinear manner with lattice displacement. The resonance frequency effects of TERO on catalyst activation are discussed.

Role of Exposed Surfaces on Zinc Oxide Nanostructures in the Catalytic Ethanol Transformation

Morales, María V.,Asedegbega-Nieto, Esther,Iglesias-Juez, Ana,Rodríguez-Ramos, Inmaculada,Guerrero-Ruiz, Antonio

, p. 2223 - 2230 (2015)

For a series of nanometric ZnO materials, the relationship between their morphological and surface functionalities and their catalytic properties in the selective decomposition of ethanol to yield acetaldehyde was explored. Six ZnO solids were prepared by a microemulsion-precipitation method and the thermal decomposition of different precursors and compared with a commercial sample. All these materials were characterized intensively by XRD and SEM to obtain their morphological specificities. Additionally, surface area determinations and IR spectroscopy were used to detect differences in the surface properties. The density of acid surface sites was determined quantitatively using an isopropanol dehydration test. Based on these characterization studies and on the results of the catalytic tests, it has been established that ZnO basal surfaces seem to be responsible for the production of ethylene as a minor product as well as for secondary reactions that yield acetyl acetate. Furthermore, one specific type of exposed hydroxyl groups appears to govern the surface catalytic properties.

Reaction of the ethyl radical with oxygen at millitorr pressures at 243-368 K and a study of the Cl + HO2, ethyl + HO2, and HO2 + HO2 reactions

Dobis, Otto,Benson, Sidney W.

, p. 8798 - 8809 (1993)

Ethyl radicals formed in the reaction of C2H6 + Cl are allowed to react with molecular oxygen in a very low pressure reactor (VLPR) experimental flow system over the temperature range of 243-368 K. Mass spectrometric analysis of reactants and products made possible the determination of rate constants (cm3/(molecule·-s)) of all major reaction steps. Mass balances for C, H, and Cl are good to ±4% on average. The elementary steps are the following: C2H5 + O2 → HO2 + C2H4, k6 = (1.42 ± 0.38) × 10-17 exp[(5064 ± 154)/RT], measured independently from recording C2H5 consumption or C2H4 formation rates; 2HO2 → H2O2, k7 = (4.50 ± 0.56) × 10-13 exp[(1064 ± 77)/RT]; C2H5 + HO2 → H2O2 + C2H4, k8a = (2.98 ± 0.11) × 10-12; Cl + HO2 → HCl + O2, k9 = (4.45 ± 0.06) × 10-11. Activation energies are given in cal/mol. Reactions 8a and 9 show no change in the temperature range of measurements, while reactions 6 and 7 both have negative temperature dependence. The radical oxidation reaction 6 is suggested to occur via excited ethylperoxy and 2-hydroperoxyethyl radical formations as consecutive reversible steps.

NEW PATHWAYS IN LASER INDUCED THERMAL GAS-PHASE CHEMISTRY

Pola, J.

, p. 607 - 616 (1990)

Various cw CO2 laser-induced reactions in the presence of energy conveying SF6 are shown to proceed in a specific way due to the absence of heterogeneous stages that are very difficult to avoid in normal hot wall reactors.Truly homogeneous courses are reported for some dehydrochlorinations, oxidations of perhaloalkenes with molecular oxygen, and decomposition of representatives of amines, nitroalkanes and perfluorinated, bridged and unsaturated derivatives of carboxylic acids.

High selectivity for ethylene from carbon dioxide reduction over copper nanocube electrocatalysts

Roberts, F. Sloan,Kuhl, Kendra P.,Nilsson, Anders

, p. 5179 - 5182 (2015)

Nanostructured surfaces have been shown to greatly enhance the activity and selectivity of many different catalysts. Here we report a nanostructured copper surface that gives high selectivity for ethylene formation from electrocatalytic CO2 reduction. The nanostructured copper is easily formed in situ during the CO2 reduction reaction, and scanning electron microscopy (SEM) shows the surface to be dominated by cubic structures. Using online electrochemical mass spectrometry (OLEMS), the onset potentials and relative selectivity toward the volatile products (ethylene and methane) were measured for several different copper surfaces and single crystals, relating the cubic shape of the copper surface to the greatly enhanced ethylene selectivity. The ability of the cubic nanostructure to so strongly favor multicarbon product formation from CO2 reduction, and in particular ethylene over methane, is unique to this surface and is an important step toward developing a catalyst that has exclusive selectivity for multicarbon products. Cubic nanostructures formed on a polycrystalline copper surface give high selectivity for ethylene formation from carbon dioxide electroreduction. The nanocubes are easily synthesized in situ, and online electrochemical mass spectrometry is used to compare the reactivity to other copper single-crystal surfaces.

Cross-metathesis vs. silylative coupling of vinyl alkyl ethers with vinylsilanes catalyzed by a ruthenium-carbene complex (Grubbs catalyst)

Marciniec,Kujawa,Pietraszuk

, p. 671 - 675 (2000)

Grubbs complex, (PCy3)2Cl2Ru=CHPh (I) is a very effective catalyst of the cross-disproportionation of vinyl-trisubstituted silanes H2C=CHSiR3 [where R3 = Me3, PhMe2, (OEt)3] with vinyl alkyl ethers H2C=CHOR' [where R' = ethyl, propyl, butyl, t-butyl, t-pentyl, 2-(ethyl)hexyl, cyclohexyl, trimethylsilyl] to yield a mixture of (E + Z) 1-silyl-2-alkoxyethenes. The reaction occurs quantitatively under milder conditions (60 °C) than the analogous one catalyzed by Ru-H and/or Ru-Si complexes reported previously (80 °C). The stoichiometric reaction of (I) and (PCy3)2Cl2Ru=CH2 (III) with vinyl ethyl ether leads to the formation of (PCy3)2Cl2Ru=CH(OEt) (II), inactive in the stoichiometric reaction with vinylsilanes but very active in the catalytic process. Experiments with the use of deuterated vinylsilanes indicate the non-metallacarbene mechanism of the reaction and provide evidence for the initiation of Ru-H bond formation via the hydrovinylation with vinylsilanes.

Identification and active site analysis of the 1-aminocyclopropane-1- carboxylic acid oxidase catalysing the synthesis of ethylene in Agaricus bisporus

Meng, Demei,Shen, Lin,Yang, Rui,Zhang, Xinhua,Sheng, Jiping

, p. 120 - 128 (2014)

Background 1-Aminocyclopropane-1-carboxylate oxidase (ACO) is a key enzyme that catalyses the final step in the biosynthesis of the plant hormone ethylene. Recently, the first ACO homologue gene was isolated in Agaricus bisporus, whereas information concerning the nature of the ethylene-forming activity of this mushroom ACO is currently lacking. Methods Recombinant ACO from A. bisporus (Ab-ACO) was purified and characterised for the first time. Molecular modelling combined with site-directed mutagenesis and kinetic and spectral analysis were used to investigate the property of Ab-ACO. Results Ab-ACO has eight amino acid residues that are conserved in the Fe (II) ascorbate family of dioxygenases, including four catalytic residues in the active site, but Ab-ACO lacks a key residue, S289. In comparison to plant ACOs, Ab-ACO requires ACC and Fe (II) but does not require ascorbate. In addition, Ab-ACO had relatively low activity and was completely dependent on bicarbonate, which could be ascribed to the replacement of S289 by G289. Moreover, the ferrous ion could induce a change in the tertiary, but not the secondary, structure of Ab-ACO. Conclusions These results provide crucial experimental support for the ability of Ab-ACO to catalyse ethylene formation in a similar manner to that of plant ACOs, but there are differences between the biochemical and catalytic characteristics of Ab-ACO and plant ACOs. General significance This work enhances the understanding of the ethylene biosynthesis pathways in fungi and could promote profound physiological research of the role of ethylene in the regulation of mushroom growth and development.

Methane conversion to ethylene over GaN catalysts. Effect of catalyst nitridation

Dutta, Kanchan,Chaudhari, Vishnu,Li, Chao-Jun,Kopyscinski, Jan

, (2020)

Vast availability of natural and shale gases makes methane a reliable source for synthesizing valuable chemical building blocks such as ethylene. A new stable supported GaN/SBA15 catalyst from an emerging class of nitride catalysts was reported for the direct non-oxidative methane coupling to ethylene. The effect of nitridation on the catalyst properties and activity was investigated. The optimum nitridation temperatures were 700 °C and 750 °C for the GaN/SBA15 and the unsupported GaN catalyst, respectively. Supported catalysts were more stable and had 5–10 times higher product (ethylene) formation rates per gram of gallium than the unsupported catalysts due to the higher surface area (>320 vs. 2 g?1) and Ga-dispersion inside the pores. Compared to the oxide precursors, the nitrides exhibited a higher atom conversion efficiency for the CH4 carbon leading to higher ethylene selectivity (71 % for GaN/SBA15, 2O3/SBA15) and lower coke selectivity (27 % for GaN/SBA15, 40 % for Ga2O3/SBA15).

Calorimetric Study of Vanadium Pentoxide Catalysts Used in the Reaction of Ethane Oxidative Dehydrogenation

Le Bars, J.,Vedrine, J. C.,Auroux, A.,Pommier, B.,Pajonk, G. M.

, p. 2217 - 2221 (1992)

Vanadium pentoxide catalysts have been studied in the partial oxidation reaction of ethane in the 723-843 K temperature range.The relationship between the acid-base properties and the catalytic behavior was investigated.The number and character of acidic sites of V2O5 catalysts were determined by studying the adsorption of a basic molecule using microcalorimetry.The reducibility level and the evolution of the surface state, as well as the heat evolved, were studied by using a pulse method with pure ethane only.The reaction of ethane oxidative dehydrogenation was studied by a continuous flow method and the activation energies for the formation of C2H4 and CO were calculated.The selectivity of the catalyst was interpreted in connection with the acid-base properties.The strong sites were observed to decrease rapidly with time on stream, although the catalysts were still active.Temperature-programmed reduction of V2O5 using a TG-DSC coupling was also investigated with hydrogen, ethylene, or ethane as reducers.The different heats of reduction are given.It was observed that C2H4 is a much more efficient reducing agent than H2 and C2H6.Following each reduction, reoxidation studies by oxygen were performed in the same equipment showing clearly different steps in the reoxidation process.

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