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4455-83-8

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4455-83-8 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 4455-83-8 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 4,4,5 and 5 respectively; the second part has 2 digits, 8 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 4455-83:
(6*4)+(5*4)+(4*5)+(3*5)+(2*8)+(1*3)=98
98 % 10 = 8
So 4455-83-8 is a valid CAS Registry Number.

4455-83-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name chloro-dimethylsilyl-dimethylsilane

1.2 Other means of identification

Product number -
Other names 1-chloro-2H-tetramethyldisilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:4455-83-8 SDS

4455-83-8Downstream Products

4455-83-8Relevant articles and documents

1.4-addition of 1.1.2.2-tetrachlorodimethyldisilane to 1.4-diaza-1.3-dienes, synthesis and molecular structure of 1.6-disila-2.5-diaza-1.1.6.6-tetrachloro-1.6-dimethyl-2.5-di-p-tolyl-3.4-diphenyl-hexa-3-ene

Herzog,Roewer,Ziemer,Herrschaft

, p. 73 - 77 (1997)

Reaction of 1.1.2.2-tetrachlorodimethyldisilane (4) with 1.4-diazadienes like benzildianil (1), benzildi-p-tolil (2) and benzildi-p-anisil (3) leads to a 1.4-addition product of the disilane under cleavage of the Si-Si bond (1a, 2a, 3a). The structure of 2a was determined by X-ray crystallography (crystal data: monoclinic, P21/n, a = 14.661(4), b = 12.283(2), c = 17.564(5) A, β = 103.13°, Z = 4, R = 0.0585 for 5992 independent reflections). Surprisingly, 2a was found to be in the cis-configuration with almost C2 symmetry and a torsion angle of only 13°. Owing to statistical disorder, some bond lengths are not in the expected range.

Making Use of the Direct Process Residue: Synthesis of Bifunctional Monosilanes

Sturm, Alexander G.,Santowski, Tobias,Schweizer, Julia I.,Meyer, Lioba,Lewis, Kenrick M.,Felder, Thorsten,Auner, Norbert,Holthausen, Max C.

supporting information, p. 8499 - 8502 (2019/06/13)

The industrial production of monosilanes MenSiCl4?n (n=1–3) through the Müller–Rochow Direct Process generates disilanes MenSi2Cl6?n (n=2–6) as unwanted byproducts (“Direct Process Residue”, DPR) by the thousands of tons annually, large quantities of which are usually disposed of by incineration. Herein we report a surprisingly facile and highly effective protocol for conversion of the DPR: hydrogenation with complex metal hydrides followed by Si?Si bond cleavage with HCl/ether solutions gives (mostly bifunctional) monosilanes in excellent yields. Competing side reactions are efficiently suppressed by the appropriate choice of reaction conditions.

CLEAVAGE OF METHYLDISILANES TO METHYLMONOSILANES

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Page/Page column 27; 28, (2019/04/16)

The invention relates to a process for the manufacture of methylmonosilanes comprising the step of subjecting one or more methyldisilanes to the cleavage reaction of the silicon-silicon bond, and optionally a step of separating the resulting methylmonosilanes.

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