Welcome to LookChem.com Sign In|Join Free

CAS

  • or

1111-74-6

Post Buying Request

1111-74-6 Suppliers

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

1111-74-6 Usage

Physical properties

Very low boiling point silane that is a gas at atmospheric conditions.

Check Digit Verification of cas no

The CAS Registry Mumber 1111-74-6 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,1,1 and 1 respectively; the second part has 2 digits, 7 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 1111-74:
(6*1)+(5*1)+(4*1)+(3*1)+(2*7)+(1*4)=36
36 % 10 = 6
So 1111-74-6 is a valid CAS Registry Number.
InChI:InChI=1/C2H6Si/c1-3-2/h1-2H3

1111-74-6SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name dimethylsilicon

1.2 Other means of identification

Product number -
Other names EINECS 214-184-7

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1111-74-6 SDS

1111-74-6Related news

Interaction of natural polyamines and DIMETHYLSILANE (cas 1111-74-6) analogues with membrane components08/19/2019

Structural analogues of the natural polyamines which contain a Si(CH3)2 group in the central carbon chain have previously been found to be cytostatic to various tumor cell lines and to inhibit tumor cell growth in experimentally-grafted animals. We show that membrane damages induced by hexamine ...detailed

Adsorption kinetics of DIMETHYLSILANE (cas 1111-74-6) at Si(0 0 1)08/14/2019

Adsorption kinetics of dimethylsilane (DMS) at Si(0 0 1) surface has been investigated by using temperature-programmed desorption (TPD). The saturated hydrogen coverage of two monolayer was identical with that from monomethylsilane (MMS)-saturated surface. By being combined with the C/H ratios w...detailed

1111-74-6Relevant articles and documents

Pierce

, p. 498,505 (1961)

Hase et al.

, p. 3454,3455, 3456, 3458 (1973)

Nelson et al.

, p. 2662,2663 (1963)

Groschwitz et al.

, p. 421,422 (1967)

Mechanism of the Gas-Phase Thermolysis of Monomethylsilane

Neudorfl, P. S.,Lown, E. M.,Safarik, I.,Jodhan, A.,Strausz, O. P.

, p. 5780 - 5789 (1987)

The thermolysis of monomethylsilane (MMS) has been studied as a function of pressure (33-400 Torr), temperature (340-440 deg C), and conversion.Under conditions of very low (tipically, 0.5percent) conversion and in a carefully seasoned vessel the major products are H2 and dimethyldisilane (DMDS).Dimethylsilane (DMS) comprises ca. 5percent of the major products.MMS-d3 generates D2 exclusively.In the presence of ca. 10percent C2H4 the yields of H2 and DMDS are considerably reduced and both products follow first-order kinetics in their formation.Also, the formation of DMS is completely suppressed, and the Arrhenius parameters for the molecular process CH3SiH3 -> CH3H + H2 (1a) when determined from the rate of H2 production and from (CH3H + CH3SiH3 -> DMDS) production are log k1a = (15.02 +/- 0.10) - (63270 +/- 310) / 2.3RT and (14.87 +/- 0.12) - (63150 +/- 350) / 2.3RT, respectively.The molecular rate constant for H2, however, includes a small contribution from radical processes that cannot be completely suppressed.When the latter expression for k1a is used, the rate data for H2 is the unscavenged reaction can be fitted to a mechanism incorporating a second primary step, a slow, surface-catalyzed reaction generating H. and CH3SiH2. radicals , which then set up a short chain: CH3SiH2. + CH3SiH3 -> DMDS + H H + CH3SiH3 -> H2 + CH3SiH2. .On the basis of kinetic analysis of the data it is concluded that the chain is terminated linearly by CH3SiH2. radicals at the surface , with log A(s-1) = 11.7 and Ea ca. 32.3 kcal mol-1.The derived rate expression for the surface-catalyzed radical initation step CH3SiH3 -> Ch3SiH2. + H (1b) is log k1b = 12.7 - 57900/2.3RT.From the measured kinetic data the following themochemical values were derived: D(CH3H-H) = 73.5 kcal mol-1 and ΔHf(CH3H) = 51.9 kcal mol-1.

-

Bond,Brockway

, p. 3312 (1954)

-

From carbon dioxide to methane: Homogeneous reduction of carbon dioxide with hydrosilanes catalyzed by zirconium-borane complexes

Matsuo, Tsukasa,Kawaguchi, Hiroyuki

, p. 12362 - 12363 (2006)

A mixture of a zirconium benzyl phenoxide complex and tris(pentafluorophenyl)borane is reported that catalyzes the hydrosilation reaction of carbon dioxide to generate methane via a bis(silyl)acetal intermediate. Copyright

THERMOCHEMISTRY OF SILICON-CONTAINING COMPOUNDS PART 1.-SILICON-HALOGEN COMPOUNDS, AN EVALUATION

Walsh, Robin

, p. 2233 - 2248 (1983)

Literature data on the heats of formation of silicon-halogen compounds have been collected and reviewed.The coverage includes all tetravalent monosilicon compounds containing Si-H-X, where X is a single halogen, as well as the subhalides SiXn, where n = 1,2 or 3.The data are critically evaluated from the standpoints of bond addivity and general chemical reactivity of the species involved as well as by detailed consideration of individual studies.Earlier compilations or reviews are discussed.A set of recommended values (with uncertainties) is proposed.For the divalent species, SiX2, a self-consistent set of lone-pair stabilisation energies is obtained.

-

Russell

, p. 4825,4826,4828 (1959)

-

Unlocking the Catalytic Hydrogenolysis of Chlorosilanes into Hydrosilanes with Superbases

Durin, Gabriel,Berthet, Jean-Claude,Nicolas, Emmanuel,Cantat, Thibault

, p. 10855 - 10861 (2021/09/08)

The efficient synthesis of hydrosilanes by catalytic hydrogenolysis of chlorosilanes is described using an iridium (III) pincer catalyst. A careful selection of a nitrogen base (including sterically hindered guanidines and phosphazenes) can unlock the preparation of Me3SiH, Et3SiH, and Me2SiHCl in high yield (up to 98%) directly from their corresponding chlorosilanes.

Hydrogenolysis of Polysilanes Catalyzed by Low-Valent Nickel Complexes

Comas-Vives, Aleix,Eiler, Frederik,Grützmacher, Hansj?rg,Pribanic, Bruno,Trincado, Monica,Vogt, Matthias

supporting information, p. 15603 - 15609 (2020/04/29)

The dehydrogenation of organosilanes (RxSiH4?x) under the formation of Si?Si bonds is an intensively investigated process leading to oligo- or polysilanes. The reverse reaction is little studied. To date, the hydrogenolysis of Si?Si bonds requires very harsh conditions and is very unselective, leading to multiple side products. Herein, we describe a new catalytic hydrogenation of oligo- and polysilanes that is highly selective and proceeds under mild conditions. New low-valent nickel hydride complexes are used as catalysts and secondary silanes, RR′SiH2, are obtained as products in high purity.

PROCESS FOR THE PRODUCTION OF ORGANOHYDRIDOCHLOROSILANES

-

Page/Page column 30, (2019/04/16)

The invention relates to a process for the manufacture of organomonosilanes bearing both hydrogen and chlorine substituents at the silicon atom by subjecting a silane substrate comprising one or more silanes selected from organomonosilanes, organodisilanes and organocarbodisilanes, with the proviso that at least one of these silanes has at least one chlorine substituent at the silicon atom, to a redistribution reaction in the presence of a phosphane or amine acting as a redistribution catalyst.

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 1111-74-6