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1,3,5,7,9,11,14-HEPTACYCLOHEXYLTRICYCLO[7.3.3.1(5,11)]HEPTASILOXANE-3,7,14-TRIOL is a complex chemical compound characterized by its large, intricate structure with multiple interconnected rings and silicon atoms. It is a seven-membered cyclic siloxane ring with three hydroxyl (OH) functional groups, making it a triol. This unique compound has potential applications in various industries, including materials science, organic chemistry, and pharmaceuticals, and may be utilized in the development of new polymers or the synthesis of novel compounds for medical or industrial uses.

47904-22-3

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47904-22-3 Usage

Uses

Used in Materials Science:
1,3,5,7,9,11,14-HEPTACYCLOHEXYLTRICYCLO[7.3.3.1(5,11)]HEPTASILOXANE-3,7,14-TRIOL is used as a component in the development of new polymers for its unique structure and properties.
Used in Organic Chemistry:
1,3,5,7,9,11,14-HEPTACYCLOHEXYLTRICYCLO[7.3.3.1(5,11)]HEPTASILOXANE-3,7,14-TRIOL is used as a reactant or intermediate in the synthesis of novel compounds due to its complex structure and functional groups.
Used in Pharmaceutical Industry:
1,3,5,7,9,11,14-HEPTACYCLOHEXYLTRICYCLO[7.3.3.1(5,11)]HEPTASILOXANE-3,7,14-TRIOL is used as a starting material or building block in the synthesis of new pharmaceutical compounds, potentially for medical applications.

Check Digit Verification of cas no

The CAS Registry Mumber 47904-22-3 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 4,7,9,0 and 4 respectively; the second part has 2 digits, 2 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 47904-22:
(7*4)+(6*7)+(5*9)+(4*0)+(3*4)+(2*2)+(1*2)=133
133 % 10 = 3
So 47904-22-3 is a valid CAS Registry Number.
InChI:InChI=1/C42H80O12Si7/c43-55(36-22-8-1-9-23-36)46-58(39-28-14-4-15-29-39)48-56(44,37-24-10-2-11-25-37)50-60(41-32-18-6-19-33-41)51-57(45,38-26-12-3-13-27-38)49-59(47-55,40-30-16-5-17-31-40)53-61(52-58,54-60)42-34-20-7-21-35-42/h36-45H,1-35H2

47904-22-3 Well-known Company Product Price

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  • Aldrich

  • (477672)  1,3,5,7,9,11,14-Heptacyclohexyltricyclo[7.3.3.15,11]heptasiloxane-3,7,14-triol  97%

  • 47904-22-3

  • 477672-1G

  • 1,818.18CNY

  • Detail

47904-22-3SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name 1,3,5,7,9,11,14-Heptacyclohexyltricyclo[7.3.3.15,11]heptasiloxane-3,7,14-triol

1.2 Other means of identification

Product number -
Other names trisilanolcyclohexyl-POSS

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:47904-22-3 SDS

47904-22-3Relevant academic research and scientific papers

Base-catalyzed cleavage and homologation of polyhedral oligosilsesquioxanes

Feher, Frank J.,Terroba, Raquel,Ziller, Joseph W.

, p. 2153 - 2154 (2007/10/03)

Readily available Cy6Si6O9 2 (Cy = c-C6H11) reacts with aqueous NEt4OH in THF to afford endo-C(2h)-Cy6Si6O7(OH)4 3a, which upon further hydrolysi

Silsesquioxanes as Models for Silica Surfaces

Feher, Frank J.,Newman, David A.,Walzer, John F.

, p. 1741 - 1748 (2007/10/02)

The hydrolytic condensation of cyclohexyltrichlorosilane (CySiCl3) affords (1), (2), and (3a).Trisilanol 1 and 3b, the bis(triphenyltin) derivative of 3a, have been structurally characterized by single-crystal X-ray diffraction studies.Trisilanol 1 undergoes corner-capping reactions with trifunctional monomers (e.g., R'SiCl3, MeGeCl3, MeSnCl3), is selectively monosilylated to (6a) with chlorotrimethylsilane, and can be dehydrated to (7a).Comparison of the molecular structure of 1 with (111) β-cristobalite and (0001)β-tridymite reveals many structural similarities.Silsesquioxanes 1, 6a, and 7a are discussed as models for silica surfaces.

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