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Silane, tris(2,4,6-trimethylphenyl)- is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

50490-73-8

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50490-73-8 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 50490-73-8 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,0,4,9 and 0 respectively; the second part has 2 digits, 7 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 50490-73:
(7*5)+(6*0)+(5*4)+(4*9)+(3*0)+(2*7)+(1*3)=108
108 % 10 = 8
So 50490-73-8 is a valid CAS Registry Number.

50490-73-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 11, 2017

Revision Date: Aug 11, 2017

1.Identification

1.1 GHS Product identifier

Product name tris(2,4,6-trimethylphenyl)silane

1.2 Other means of identification

Product number -
Other names trimesitylsilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:50490-73-8 SDS

50490-73-8Relevant academic research and scientific papers

The Cyclohexadienyl-Leaving-Group Approach toward Donor-Stabilized Silylium Ions

Simonneau, Antoine,Biberger, Tobias,Oestreich, Martin

, p. 3927 - 3929 (2015)

The cyclohexa-2,5-dien-1-yl group is established as a leaving group at silicon as an alternative to the Bartlett-Condon-Schneider silicon-to-carbon hydride transfer and the allyl-leaving-group approach to generate silylium ions. Hydride abstraction from t

Torsional distortions in trimesitylsilanes and trimesitylgermanes

Lambert, Joseph B.,Stern, Charlotte L.,Zhao, Yan,Tse, Winston C.,Shawl, Catherine E.,Lentz, Kirk T.,Kania, Lidia

, p. 21 - 31 (1998)

The crystal structures have been solved for allyltrimesitylsilane (3), trimesitylsilane (4), and trimesitylgermane (5). Steric congestion caused by the three mesityl groups causes some lengthening of the Si-C and Ge-C bonds. The C-Si-C and C-Ge-C bond ang

Silylium ion/phosphane lewis pairs

Reissmann, Matti,Schaefer, Andre,Jung, Sebastian,Mueller, Thomas

, p. 6736 - 6744 (2014/01/06)

The reactivity of a series of silylium ion/phosphane Lewis pairs was studied. Triarylsilylium borates 4[B(C6F5)4] form frustrated Lewis pairs (FLPs) of moderate stability with sterically hindered phosphanes 2. Some of these FLPs are able to cleave dihydrogen under ambient conditions. The combination of bulky trialkylphosphanes with triarylsilylium ions can be used to sequester CO2 in the form of silylacylphosphonium ions 12. The ability to activate molecular hydrogen by reaction of silylium ion/phosphane Lewis pairs is dominated by thermodynamic and steric factors. For a given silylium ion increasing proton affinity and increasing steric hindrance of the phosphane proved to be beneficial. Nevertheless, excessive steric hindrance leads to a breakdown of the dihydrogen-splitting activity of a silylium/phosphane Lewis pair.

Generation of silanimines by photolysis of hindered azidosilanes

Zigler, Steven S.,Johnson, Leighta M.,West, Robert

, p. 187 - 198 (2007/10/02)

Trimesitylazidosilane (1) and three new azidosilanes, Mes2Si(N3)SiPh2-t-Bu (2), Me2Si(N3)SiMes2-t-Bu (3) and i-Pr2Si(N3)SiMes2-t-Bu (4), were prepared and photolyzed at 254 nm.Compound 1 photolyzes in glassy 3-methylpentane (3-MP) at 77 K or in 3-MP solut

TRIARYL-SILYL, -GERMYL, AND -STANNYL RADICALS MAr3 (M=Si, Ge, OR Sn AND Ar=2,4,6-Me3C6H2) AND Ge(2,6-Me2C6H3)3: SYNTHESIS AND ESR STUDIES

Gynane, Michael J. S.,Lappert, Michael F.,Riley, Paul I.,Riviere, Pierre,Riviere-Baudet, Monique

, p. 5 - 12 (2007/10/02)

The triarylmetal-centred radicals MAr3 (M=Si, Ge, or Sn: Ar=2,6-Me2C6H3 or 2,4,6-Me3C6H2) have been prepared from the appropriate triarylmetal chloride, MAr3Cl, and an electron-rich olefin >2 (R=Me or Et) under UV irradiation in toluene at low

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