51319-99-4 Usage
Uses
Used in Chemical Vapor Deposition:
Tin (II) hexafluoroacetylacetonate is used as a precursor for the synthesis of tin oxide coatings in various applications. It is employed in chemical vapor deposition processes to produce thin films and nanoparticles for use in gas sensors, transparent conductive coatings, and solar cells.
Used in Organic Synthesis:
Tin (II) hexafluoroacetylacetonate is utilized as a catalyst in organic synthesis, facilitating various chemical reactions and improving the efficiency of the synthesis process.
Used in Material Science:
Tin (II) hexafluoroacetylacetonate is used as a source of tin for chemical vapor deposition processes, enabling the production of tin-containing materials with specific properties and applications.
It is important to handle Tin (II) hexafluoroacetylacetonate with caution due to its potential health and environmental risks.
Check Digit Verification of cas no
The CAS Registry Mumber 51319-99-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,1,3,1 and 9 respectively; the second part has 2 digits, 9 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 51319-99:
(7*5)+(6*1)+(5*3)+(4*1)+(3*9)+(2*9)+(1*9)=114
114 % 10 = 4
So 51319-99-4 is a valid CAS Registry Number.
InChI:InChI=1/2C5H2F6O2.Sn/c2*6-4(7,8)2(12)1-3(13)5(9,10)11;/h2*1,12H;/q;;+2/p-2/b2*2-1-;
51319-99-4Relevant academic research and scientific papers
Tin(ii) hexafluoroacetylacetonate as a precursor in atmospheric pressure chemical vapour deposition: Synthesis, structure and properties
Sevastyanov, Vladimir G.,Simonenko, Elizaveta P.,Ignatov, Petr A.,Popov, Viktor S.,Churakov, Andrei V.,Kuznetsov, Nikolai T.,Sergienko, Vladimir S.
, p. 239 - 241 (2013/01/15)
A new method for the synthesis of volatile tin(ii) hexafluoroacetylacetonate [Sn(C5HO2F6)2] was suggested, the compound was characterized by elemental analysis, IR spectroscopy, and DTA/TGA; the crystal structure was established by X-ray diffraction; the morphology and composition of the coating deposited by atmospheric pressure chemical vapour deposition were studied by SEM-EDX and XRD.
