5466-89-7

Usage

Uses

U-0521 is an extraneuronal COMT uptake inhibitor.

InChI:InChI=1/C10H12O3/c1-6(2)10(13)7-3-4-8(11)9(12)5-7/h3-6,11-12H,1-2H3

Upstream product

• 91-16-7 1,2-dimethoxybenzene 
• 14046-55-0 isobutyryl-3,4-dimethoxybenzene 

Downstream Products

• 86686-44-4 2-Brom-3',4'-dihydroxyisobutyrophenon 
• 95622-49-4 3',4'-Dibenzyloxy-2-methyl-propiophenon 
• 67464-98-6 2,3',4'-Trihydroxy-2-methyl-propiophenon 

Relevant academic research and scientific papers

FLUORINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND COMPOUND

A compound represented by formula (e): where R1 represents a branched chain or cyclic alkyl group having 3 to 10 carbon atoms, and Rf1 and Rf2 represent fluorinated alkoxy groups.

Substituent effects at the benzyl position and aromatic ring of silane-coupling agents containing 2-nitrobenzyl esters on photosensitivity and hydrophobic surface of a self-assembled monolayer (SAM)

Silane-coupling agents with 2-nitrobenzyl esters containing alkyl substituents at the benzyl position and alkoxy and/or fluoroalkoxy groups of the aromatic ring were synthesized to prepare a self-assembled monolayer (SAM) on quartz glass, silicon wafer and thermally oxidized silicon wafer. The resulting photosensitive SAMs before and after photoirradiation were characterized by contact angle measurement, UV spectroscopy, X-ray photoelectron spectroscopy (XPS), and X-ray reflectivity (XRR). Photosensitivity of the SAM was influenced by substituents at the benzyl position and aromatic ring as well as the irradiation conditions in air or solution and substrates employed. Silane-coupling agents with bulky substituent at the benzyl position and double fluoroalkoxy chains are preferable in terms of the photosensitivity and hydrophobic surface.

Surface control of a photoresponsive self-assembled monolayer and selective deposition of Ag Nanoparticulate Ink

A highly hydrophobic self-assembled monolayer (SAM) with high photosensitivity to soft UV (λ = 365 nm) was formed on thermally surface-oxidized silicon wafers by a silane coupling agent bearing a 2-nitrobenzyl carbamate moiety. Very smooth SAM was obtaine

FLOURINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERNING, PHOTODEGRADABLE COUPLING AGENT, PATTERNING METHOD, AND COMPOUND

A fluorine-containing compound represented by General formula (1), wherein X represents a halogen atom or an alkoxy group, R1 represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms, Rf1 and Rf2 are each independently a fluorinated alkoxy group, and n represents an integer of 0 or more.