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cyclopenta-2,4-dien-1-yl(trifluoro)silane is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

55765-70-3

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55765-70-3 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 55765-70-3 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,5,7,6 and 5 respectively; the second part has 2 digits, 7 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 55765-70:
(7*5)+(6*5)+(5*7)+(4*6)+(3*5)+(2*7)+(1*0)=153
153 % 10 = 3
So 55765-70-3 is a valid CAS Registry Number.

55765-70-3SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 15, 2017

Revision Date: Aug 15, 2017

1.Identification

1.1 GHS Product identifier

Product name cyclopenta-2,4-dien-1-yl(trifluoro)silane

1.2 Other means of identification

Product number -
Other names Silane,2,4-cyclopentadien-1-yltrifluoro

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:55765-70-3 SDS

55765-70-3Downstream Products

55765-70-3Relevant academic research and scientific papers

REACTIONS OF DIFLUOROSILYLENE WITH CYCLIC ALKENES: CYCLOPENTADIENE AND CYCLOHEPTATRIENE

Lee, W. L.,Shieh, C. F.,Liu, C. S.

, p. 23 - 34 (1986)

The reactions of difluorosilylene with cyclopentadiene and cycloheptatriene were studied both in the gas phase and by the cocondensation method.Several new organosilicon compounds were synthesized and their structures characterized.In the cycloheptatriene reaction the comparison between the results from the gas phase and cocondensation experiments provides the first solid evidence which makes it possible to differentiate between the silirane mechanism and the .SiF2SiF2. diradical mechanism in the "addition reactions" of difluorosilylene.

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