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1,1,2,2,4,4-hexamethyl-1,2,4-trisilacyclopentane is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

58679-67-7

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58679-67-7 Usage

Type of Compound

Silicon-based compound

Structure

Unique cyclic structure

Thermal Stability

High thermal stability

Industrial Applications

Useful in a variety of industrial applications

Reactivity

Highly reactive

Use as a Reagent

Commonly used in the synthesis of more complex silicon-based molecules

Potential Applications

Semiconductor technology, materials science, and organic chemistry

Significance

Important building block in the development of new and innovative silicon-based materials and technologies

Check Digit Verification of cas no

The CAS Registry Mumber 58679-67-7 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 5,8,6,7 and 9 respectively; the second part has 2 digits, 6 and 7 respectively.
Calculate Digit Verification of CAS Registry Number 58679-67:
(7*5)+(6*8)+(5*6)+(4*7)+(3*9)+(2*6)+(1*7)=187
187 % 10 = 7
So 58679-67-7 is a valid CAS Registry Number.

58679-67-7SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name 1,1,2,2,4,4-hexamethyl-1,2,4-trisilolane

1.2 Other means of identification

Product number -
Other names 1,1,2,2,4,4-hexamethyl-1,2,4-trisilacyclopentane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:58679-67-7 SDS

58679-67-7Downstream Products

58679-67-7Relevant academic research and scientific papers

Bis[bis(methylthio)lithiomethyl]dimethylsilanes: A useful reagent for the synthesis of polysilacarbacycles via disilylation

Shimizu, Masaki,Iwakubo, Masayuki,Nishihara, Yasushi,Hiyama, Tamejiro

, p. 3193 - 3196 (1998)

Bis[bis(methylthio)lithiomethyl]dimethylsilane was generated from bis[bis(methylthio)methyl]dimethylsilane by deprotonation with t-BuLi in THF and allowed to react with various dichloro(poly)silanes to give the corresponding 4- to 7-membered polysilacarba

Formation of 1,2,4-trisilacyclopentanes by photolysis of FpCH2SiR2SiR2SiR2CH2Fp (Fp = (η5-C5H5)Fe(CO)2)

Zhang, Yongqiang,Pannell, Keith H.

, p. 503 - 510 (2008/10/08)

Photolysis of FpCH2SiMe2SiMe2SiMe2CH2Fp (1), Fp = [(η5-C5H5)Fe(CO)2], resulted in almost quantitative formation of 1,1,2,2,4,4-hexamethyl-1,2,4-trisilacyclopentane (2) and Fp2. Similar treatment of FpCH2Me2SiMeSiEtSiMe2CH2Fp (6) afforded 1-ethyl-1,2,2,4,4-pentamethyl-1,2,4-trisilacyclopentane (7), indicating that the central silicon of the trisilane remains associated with the silicon-silicon bond of the product. Irradiation of FpCH2-PhMeSiSiMe2SiMe2CH2Fp (11) led to the formation of the two positional isomers (ratio 4:3), 1,1,2,2,4-heptamethyl-4-phenyl-1,2,4-trisilacyclopentane (12a) and 1,1,2,4,4-heptamethyl-2-phenyl-1,2,4-trisilacyclopentane (12b), indicating that either one of the two terminal silicon atoms of the trisilane remains in the Si-Si bond of the product while the other becomes the silicon atom of the product at 4-position. A mechanism for the formation of 1,2,4-trisilacyclopentane is suggested. Irradiation of 11 also produced a small amount the rearranged product FpPhMeSiCH2SiMe2CH2SiMe2Fp (13), whereas photochemical treatment of the tetrasilane analogue, FpCH2SiMe2SiMe2SiMe2SiMe2 CH2Fp (15), resulted in only the high-yield rearrangement product FpMe2SiCH2SiMe2SiMe2CH2Si Me2Fp (17) with an absence of elimination products.

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