59696-06-9

Basic information

• Product Name: bis(4-chlorophenyl)iodonium tosylate
• Synonyms: bis(4-chlorophenyl)iodonium tosylate
• CAS NO: 59696-06-9
• Molecular Weight: 521.203
• Mol File: 59696-06-9.mol
• Article Data: 3

Chemical Properties

• CAS DataBase Reference: bis(4-chlorophenyl)iodonium tosylate(CAS DataBase Reference)
• NIST Chemistry Reference: bis(4-chlorophenyl)iodonium tosylate(59696-06-9)
• EPA Substance Registry System: bis(4-chlorophenyl)iodonium tosylate(59696-06-9)

Safety Data

• Hazardous Substances Data: 59696-06-9(Hazardous Substances Data)

Upstream product

• 104-15-4 toluene-4-sulfonic acid 
• 108-90-7 chlorobenzene 

Downstream Products

• 6377-63-5 4-chlorophenyl 4-methylphenyl ether 
• 7005-72-3 4-chlorodiphenyl ether 
• 40843-46-7 4-(4-chlorophenoxy)anisole 
• 2444-89-5 4,4'-dichlorodiphenyl ether 
• 1836-74-4 4-(4-chlorophenoxy)nitrobenzene 

Relevant articles and documents

Facile preparation of unsymmetrical diaryl ethers from unsymmetrical diaryliodonium tosylates and phenols with high regioselectivity

Unsymmetrical diaryl ethers were efficiently obtained in good yields by the reactions of aryl(4-methoxyphenyl)iodonium tosylates with phenols, and aryl(2,4-dimethoxyphenyl)iodonium tosylates with phenols, in the presence of potassium carbonate in acetonitrile, respectively. The latter iodonium tosylates provided the corresponding unsymmetrical diaryl ethers in good yields with high regioselectivities, together with the quantitative formation of 1-iodo-2,4-dimethoxybenzene. Georg Thieme Verlag Stuttgart New York.

Novel carbazole derivative and chemically amplified radiation-sensitive resin composition

A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.