6026-22-8 Usage
Uses
Used in Organic Chemistry:
(Hydrazino-methyl-trimethylsilyl-silyl)hydrazine is used as a reagent in organic chemistry for its ability to participate in various chemical reactions, contributing to the synthesis of organic compounds.
Used in Materials Science:
In materials science, (hydrazino-methyl-trimethylsilyl-silyl)hydrazine is used as a component in the development of new materials, thanks to its silyl groups that can improve the stability and reactivity of the resulting compounds.
Used in Pharmaceutical Industry:
(Hydrazino-methyl-trimethylsilyl-silyl)hydrazine is used as a precursor in the pharmaceutical industry, where its unique properties may contribute to the creation of new drugs or drug delivery systems.
Used in Agrochemicals:
(hydrazino-methyl-trimethylsilyl-silyl)hydrazine is also used in the agrochemical industry as a starting material for the synthesis of various agrochemical products, potentially enhancing their effectiveness and stability.
Research on (hydrazino-methyl-trimethylsilyl-silyl)hydrazine is ongoing, exploring its potential use in diverse fields and its effects on biological systems, which may lead to further applications in the future.
Check Digit Verification of cas no
The CAS Registry Mumber 6026-22-8 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 6,0,2 and 6 respectively; the second part has 2 digits, 2 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 6026-22:
(6*6)+(5*0)+(4*2)+(3*6)+(2*2)+(1*2)=68
68 % 10 = 8
So 6026-22-8 is a valid CAS Registry Number.
6026-22-8Relevant academic research and scientific papers
Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same
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Page/Page column 3, (2008/06/13)
This invention relates to silicon precursor compositions for forming silicon-containing films by low temperature (e.g., 550° C.) chemical vapor deposition processes for fabrication of ULSI devices and device structures. Such silicon precursor compositions comprise at least a silane or disilane derivative that is substituted with at least one alkylhydrazine functional groups and is free of halogen substitutes.
