635680-64-7Relevant academic research and scientific papers
Synthesis of Metal Nanoparticles and Metal Fluoride Nanoparticles from Metal Amidinate Precursors in 1-Butyl-3-Methylimidazolium Ionic Liquids and Propylene Carbonate
Schütte, Kai,Barthel, Juri,Endres, Manuel,Siebels, Marvin,Smarsly, Bernd M.,Yue, Junpei,Janiak, Christoph
, p. 137 - 148 (2017/02/10)
Decomposition of transition-metal amidinates [M{MeC(NiPr)2}n] [M(AMD)n; M=MnII, FeII, CoII, NiII, n=2; CuI, n=1) induced by microwave heating in the ionic liquids (ILs) 1-butyl-3-methylimidazolium tetrafluoroborate ([BMIm][BF4]), 1-butyl-3-methylimidazolium hexafluorophosphate ([BMIm][PF6]), 1-butyl-3-methylimidazolium trifluoromethanesulfonate (triflate) ([BMIm][TfO]), and 1-butyl-3-methylimidazolium tosylate ([BMIm][Tos]) or in propylene carbonate (PC) gives transition-metal nanoparticles (M-NPs) in non-fluorous media (e.g. [BMIm][Tos] and PC) or metal fluoride nanoparticles (MF2-NPs) for M=Mn, Fe, and Co in [BMIm][BF4]. FeF2-NPs can be prepared upon Fe(AMD)2 decomposition in [BMIm][BF4], [BMIm][PF6], and [BMIm][TfO]. The nanoparticles are stable in the absence of capping ligands (surfactants) for more than 6 weeks. The crystalline phases of the metal or metal fluoride synthesized in [BMIm][BF4] were identified by powder X-ray diffraction (PXRD) to exclusively Ni- and Cu-NPs or to solely MF2-NPs for M=Mn, Fe, and Co. The size and size dispersion of the nanoparticles were determined by transmission electron microscopy (TEM) to an average diameter of 2(±2) to 14(±4) nm for the M-NPs, except for the Cu-NPs in PC, which were 51(±8) nm. The MF2-NPs from [BMIm][BF4] were 15(±4) to 65(±18) nm. The average diameter from TEM is in fair agreement with the size evaluated from PXRD with the Scherrer equation. The characterization was complemented by energy-dispersive X-ray spectroscopy (EDX). Electrochemical investigations of the CoF2-NPs as cathode materials for lithium-ion batteries were simply evaluated by galvanostatic charge/discharge profiles, and the results indicated that the reversible capacity of the CoF2-NPs was much lower than the theoretical value, which may have originated from the complex conversion reaction mechanism and residue on the surface of the nanoparticles.
Synthesis and characterization of copper(l) amidinates as precursors for atomic layer deposition (ALD) of copper metal
Li, Zhengwen,Barry, Sean T.,Gordon, Roy G.
, p. 1728 - 1735 (2008/10/09)
A series of copper(I) amidinates of the general type [(R NC(R)NR JCu] 2 (R and R = n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl; R = methyl, n-butyl) have been synthesized and characterized. These compounds are planar dimers, bridged by nearly linear N-Cu-N bonds. Their properties (volatility, low melting point, high thermal stability, and self-limited surface reactivity) are well-suited for atomic layer deposition (ALD) of copper metal films that are pure, highly conductive, conformal, and strongly adherent to substrates.
Synthesis and Characterization of Volatile, Thermally Stable, Reactive Transition Metal Amidinates
Lim, Booyong S.,Rahtu, Antti,Park, Jin-Seong,Gordon, Roy G.
, p. 7951 - 7958 (2008/10/09)
A series of homoleptic metal amidinates of the general type [M(R-R′AMD)n]x (R = iPr, tBu, R′ = Me, tBu) has been prepared and structurally characterized for the transition metals Ti, V, Mn, Fe, Co, Ni, Cu, Ag, and La. In oxidation state 3, monomeric structures were found for the metals Ti(III), V(III), and La(III). Bridging structures were observed for the metals in oxidation state 1. Cu(I) and Ag(I) are held in bridged dimers, and Ag(I) also formed a trimer that cocrystallized with the dimer. Metals in oxidation state 2 occurred in either monomeric or dimeric form. Metals with smaller ionic radii (Co, Ni) were monomeric. Larger metals (Fe, Mn) gave monomeric structures only with the bulkier tert-butyl-substituted amidinates, while the less bulky isopropyl-substituted amidinates formed dimers. The new compounds were found to have properties well-suited for use as precursors for atomic layer deposition (ALD) of thin films. They have high volatility, high thermal stability, and high and properly self-limited reactivity with molecular hydrogen, depositing pure metals, or water vapor, depositing metal oxides.
