662-22-6 Usage
Uses
Used in Pharmaceutical Industry:
2,2-BIS(TRIFLUOROMETHYL)-2-HYDROXYACETIC ACID is used as a potent inhibitor for mandelate racemase, a key enzyme involved in bacterial cell wall synthesis. Its novel binding mode offers a new approach to targeting this enzyme, which could lead to the development of new antibiotics to combat drug-resistant bacterial infections.
Used in Chemical Synthesis:
In the field of chemical synthesis, 2,2-BIS(TRIFLUOROMETHYL)-2-HYDROXYACETIC ACID can be utilized as a building block or intermediate for the creation of more complex molecules with specific properties. Its unique structure and functional groups make it a valuable component in the synthesis of various compounds, including pharmaceuticals, agrochemicals, and specialty chemicals.
Used in Material Science:
2,2-BIS(TRIFLUOROMETHYL)-2-HYDROXYACETIC ACID's properties may also find applications in material science, where it could be used to develop new materials with specific characteristics, such as improved thermal stability, chemical resistance, or enhanced mechanical properties. These materials could be used in various industries, including automotive, aerospace, and electronics.
Used in Research and Development:
2,2-BIS(TRIFLUOROMETHYL)-2-HYDROXYACETIC ACID can serve as a valuable research tool for scientists studying enzyme inhibition, molecular recognition, and the development of novel drugs. Its unique structure and properties make it an interesting candidate for exploring new mechanisms of action and potential therapeutic applications.
Check Digit Verification of cas no
The CAS Registry Mumber 662-22-6 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 6,6 and 2 respectively; the second part has 2 digits, 2 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 662-22:
(5*6)+(4*6)+(3*2)+(2*2)+(1*2)=66
66 % 10 = 6
So 662-22-6 is a valid CAS Registry Number.
InChI:InChI=1/C4H2F6O3/c5-3(6,7)2(13,1(11)12)4(8,9)10/h13H,(H,11,12)
662-22-6Relevant academic research and scientific papers
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION FOR ArF IMMERSION LITHOGRAPHY AND PATTERN FORMING PROCESS
-
Page/Page column, (2013/03/26)
A chemically amplified positive resist composition comprising (A) a sulfonium salt of 3,3,3-trifluoro-2-hydroxy-2-trifluoromethylpropionic acid, (B) an acid generator, (C) a base resin, and (D) an organic solvent is suited for ArF immersion lithography. The carboxylic acid sulfonium salt is highly hydrophobic and little leached out in immersion water. By virtue of controlled acid diffusion, a pattern profile with high resolution can be constructed.
