6689-19-6 Usage
Uses
Used in Cosmetic and Personal Care Industry:
3,5,7-TRIPHENYLNONAMETHYLPENTASILOXANE is used as an emollient and skin conditioning agent for its ability to provide a smooth and silky feel to the skin, enhancing the texture and performance of moisturizers, lotions, and hair care products.
Used in Skincare Formulations:
3,5,7-TRIPHENYLNONAMETHYLPENTASILOXANE is used as a protective barrier agent to help prevent moisture loss from the skin, offering a hydrating effect and contributing to the skin's overall health and appearance.
Used in Formulation Development:
3,5,7-TRIPHENYLNONAMETHYLPENTASILOXANE is utilized as a solubilizer and dispersant in cosmetic formulations, ensuring the even distribution of other ingredients and improving the stability and effectiveness of the final product.
Check Digit Verification of cas no
The CAS Registry Mumber 6689-19-6 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 6,6,8 and 9 respectively; the second part has 2 digits, 1 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 6689-19:
(6*6)+(5*6)+(4*8)+(3*9)+(2*1)+(1*9)=136
136 % 10 = 6
So 6689-19-6 is a valid CAS Registry Number.
InChI:InChI=1/C27H42O4Si5/c1-32(2,3)28-34(7,25-19-13-10-14-20-25)30-36(9,27-23-17-12-18-24-27)31-35(8,29-33(4,5)6)26-21-15-11-16-22-26/h10-24H,1-9H3
6689-19-6Relevant academic research and scientific papers
FEATURES OF INFLUENCE OF HCl ON HYDROLYTIC COPOLYCONDENSATION OF BIFUNCTIONAL ORGANOCHLOROSILANES WITH TRIMETHYLCHLOROSILANE
Kopylov, V. M.,Agashkov, S. P.,Sunkovich, G. V.,Prikhod'ko, P. L.
, p. 1257 - 1261 (2007/10/02)
The hydrogen chloride that is formed in the hydrolytic copolycondensation of R'RSiCl2 with Me3SiCl affects the composition of the reaction products only at cocentrations above 30-35percent, where it is responsible for splitting out the terminal trimethylsiloxy group.The stability of the terminal groups increases with increasing size of the substituents on the silicon atom in the R'RSiCl2.The total yield of Me3SiO(R'RSiO)mSiMe3 with m = 1-4 also increases with increasing size of the substituents on the silicon atom in the R'RSiCl2.The total yield of p with p = 3-5 increases with decreasing tendency of the R'RSiCl2 to form rings by hydrolytic polycondensation, and with increasing sensitivity of the terminal trimethylsiloxy group in the cocondensation products to the action of HCl and its activity with respect to the siloxane bond.
