6787-86-6 Usage
Uses
Used in Chemical Synthesis:
1,3-DISILABUTANE is used as a building block for the synthesis of various organosilicon compounds and polymers, contributing to the development of new materials with unique properties.
Used as a Solvent:
Due to its chemical properties, 1,3-DISILABUTANE is used as a solvent in various chemical processes, facilitating reactions and improving the efficiency of production.
Used in Adhesives, Sealants, and Coatings:
1,3-DISILABUTANE is utilized in the manufacturing of adhesives, sealants, and coatings, enhancing their performance and durability.
Used as a Coupling Agent:
In the production of hybrid organic-inorganic materials, 1,3-DISILABUTANE serves as a coupling agent, improving the compatibility and integration of different materials.
Used in Electronics Industry:
1,3-DISILABUTANE finds applications in the electronics industry, where its properties contribute to the development of advanced electronic components and devices.
Used in Construction Industry:
In the construction industry, 1,3-DISILABUTANE is used to improve the performance of building materials, such as adhesives and sealants, ensuring better durability and resistance to environmental factors.
Used in Pharmaceutical Industry:
1,3-DISILABUTANE has potential applications in the pharmaceutical industry, where its unique properties can be harnessed for the development of new drugs and drug delivery systems.
Check Digit Verification of cas no
The CAS Registry Mumber 6787-86-6 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 6,7,8 and 7 respectively; the second part has 2 digits, 8 and 6 respectively.
Calculate Digit Verification of CAS Registry Number 6787-86:
(6*6)+(5*7)+(4*8)+(3*7)+(2*8)+(1*6)=146
146 % 10 = 6
So 6787-86-6 is a valid CAS Registry Number.
InChI:InChI=1/C2H10Si2/c1-4-2-3/h2,4H2,1,3H3
6787-86-6Relevant academic research and scientific papers
Synthetic Pathways to Simple Di- and Trisilylmethanes: Potential Starting Materials for the CVD Deposition of Amorphous Silicon a-SiC:H
Schmidbaur, Hubert,Ebenhoech, Jan
, p. 1527 - 1534 (2007/10/02)
Methods for the preparation of simple silaalkanes with a high content of silicon and hydrogen have been explored.Target molecules, like H3SiCH2SiH3 and HC(SiH3)3, may serve as precursor molecules for the production of photovoltaic elements through thermal or discharge (plasma) CVD processes.Among a variety of synthetic pathways, the reactions between HSiCl3 and HCCl3 in the presence of an amine (Benkeser reaction) and the direct synthesis from silicon and polychloromethanes proved most promising for large scale preparations.The CH2X2/KSiH3 metathesis is most useful on the laboratory scale. - The Grignard synthesis was employed for partly methylated homologues, like H3SiCH2SiH2CH3, H3SiCH2SiH(CH3)2, H3SiCH2Si(CH3)3, and related molecules.The magnesium reduction of CHBr3/SiCl4 and CHBr3/CH3SiCl3 mixtures serves best for the preparation of HC(SiCl3)3, which can be converted into HC(SiH3)3 using LiAlH4.Attempts to synthesize tetrasilylmethane via the same route, C(SiH3)4, led only to the formation of HC(SiH3)3. - Key words: Amorphous Silicon a-SiC:H, Disilylmethane, Trisilylmethane, Direct Synthesis, Polysilylmethanes
