685-09-6 Usage
Uses
Used in Coatings Industry:
METHYL PENTAFLUOROMETHACRYLATE is used as a monomer for the development of coatings that require strong repellent properties against water, oil, and other liquids. Its incorporation into these coatings enhances their durability and resistance to environmental factors.
Used in Adhesives Industry:
In the adhesives industry, METHYL PENTAFLUOROMETHACRYLATE is used as a component in the formulation of adhesives with improved bonding strength and resistance to various substances, thanks to its strong repellent properties.
Used in Surface Treatments:
METHYL PENTAFLUOROMETHACRYLATE is utilized as a key ingredient in surface treatments to provide a protective layer with exceptional resistance to water, oil, and other liquids, thereby increasing the longevity and performance of treated surfaces.
Used in Specialty Plastics Manufacturing:
This chemical compound is used as a monomer in the production of specialty plastics that demand high-performance characteristics, such as resistance to chemicals, temperature extremes, and wear.
Used in Optical Films Production:
METHYL PENTAFLUOROMETHACRYLATE is employed as a monomer in the creation of optical films, where its properties contribute to the development of high-quality films with specific optical and physical properties.
Used in Electronic Materials Industry:
In the electronic materials industry, METHYL PENTAFLUOROMETHACRYLATE is used as a component in the manufacturing of materials with unique electronic properties, such as insulation and resistance to electrical breakdown.
Check Digit Verification of cas no
The CAS Registry Mumber 685-09-6 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 6,8 and 5 respectively; the second part has 2 digits, 0 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 685-09:
(5*6)+(4*8)+(3*5)+(2*0)+(1*9)=86
86 % 10 = 6
So 685-09-6 is a valid CAS Registry Number.
InChI:InChI=1/C5H3F5O2/c1-12-4(11)2(3(6)7)5(8,9)10/h1H3
685-09-6Relevant academic research and scientific papers
Metal-catalyzed addition polymers for 157 nm resist applications. Synthesis and polymerization of partially fluorinated, ester-functionalized tricyclo [4.2.1.02,5]non-7-enes
Sanders, Daniel P.,Connor, Eric F.,Grubbs, Robert H.,Hung, Raymond J.,Osborn, Brian P.,Chiba, Takashi,MacDonald, Scott A.,Grant Willson,Conley, Will
, p. 1534 - 1542 (2007/10/03)
Fluorinated tricyclo[4.2.1.02,5]non-7-ene-3-carboxylic acid esters are shown to undergo metal-catalyzed addition polymerization. The resulting homopolymers are transparent at 157 nm and demonstrate the utility of these monomers in development of photoresists for 157 nm lithography. Fluorinated tricyclononene (TCN) structures with ester substituents exhibit up to 3 orders of magnitude more transparency at 157 nm than conventional ester-functionalized norbornene structures as determined by gas-phase vacuum-ultraviolet spectroscopy and variable angle spectroscopic ellipsometry. Unlike their fluorinated norbornene counterparts, the fluorinated, ester-functionalized TCN monomers successfully undergo transition-metal-catalyzed addition polymerization to produce polymers with high glass transition temperatures and the etch resistance required for photolithographic resist materials applications. The potential use of fluorinated TCN structures for 157 nm photoresists is demonstrated through the synthesis and characterization of TCN monomers and polymers.
