72017-59-5

Basic information

• Product Name: tert-Butyl(3,4-dihydroxyphenyl) ketone
• Synonyms: tert-Butyl(3,4-dihydroxyphenyl) ketone
• CAS NO: 72017-59-5
• Molecular Formula: C₁₁H₁₄O₃
• Molecular Weight: 194.2271
• Mol File: 72017-59-5.mol

Chemical Properties

• Boiling Point: 373°Cat760mmHg
• Flash Point: 193.6°C
• Appearance: /
• Density: 1.16g/cm³
• Vapor Pressure: 4.29E-06mmHg at 25°C
• Refractive Index: 1.557
• CAS DataBase Reference: tert-Butyl(3,4-dihydroxyphenyl) ketone(CAS DataBase Reference)
• NIST Chemistry Reference: tert-Butyl(3,4-dihydroxyphenyl) ketone(72017-59-5)
• EPA Substance Registry System: tert-Butyl(3,4-dihydroxyphenyl) ketone(72017-59-5)

Safety Data

• Hazardous Substances Data: 72017-59-5(Hazardous Substances Data)

Usage

InChI:InChI=1/C11H14O3/c1-11(2,3)10(14)7-4-5-8(12)9(13)6-7/h4-6,12-13H,1-3H3

Upstream product

• 30314-46-6 1-(3,4-dimethoxyphenyl)-2,2-dimethylpropan-1-one 
• 91-16-7 1,2-dimethoxybenzene 
• 1538-75-6 2,2-dimethylpropanoic anhydride 
• 14046-55-0 isobutyryl-3,4-dimethoxybenzene 

Relevant articles and documents

FLUORINE-CONTAINING COMPOUND, SUBSTRATE FOR PATTERN FORMATION, PHOTODEGRADABLE COUPLING AGENT, PATTERN FORMATION METHOD, AND COMPOUND

A compound represented by formula (e): where R1 represents a branched chain or cyclic alkyl group having 3 to 10 carbon atoms, and Rf1 and Rf2 represent fluorinated alkoxy groups.

Substituent effects at the benzyl position and aromatic ring of silane-coupling agents containing 2-nitrobenzyl esters on photosensitivity and hydrophobic surface of a self-assembled monolayer (SAM)

Silane-coupling agents with 2-nitrobenzyl esters containing alkyl substituents at the benzyl position and alkoxy and/or fluoroalkoxy groups of the aromatic ring were synthesized to prepare a self-assembled monolayer (SAM) on quartz glass, silicon wafer and thermally oxidized silicon wafer. The resulting photosensitive SAMs before and after photoirradiation were characterized by contact angle measurement, UV spectroscopy, X-ray photoelectron spectroscopy (XPS), and X-ray reflectivity (XRR). Photosensitivity of the SAM was influenced by substituents at the benzyl position and aromatic ring as well as the irradiation conditions in air or solution and substrates employed. Silane-coupling agents with bulky substituent at the benzyl position and double fluoroalkoxy chains are preferable in terms of the photosensitivity and hydrophobic surface.