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(4-fluorophenyl)(4-(methylthio)phenyl)methanone is a chemical compound with the molecular formula C15H12FOS. It is an organic molecule that belongs to the class of ketones, characterized by the presence of a carbonyl group (C=O) bonded to two carbon-containing groups. In this specific compound, one of the groups is a 4-fluorophenyl ring, which contains a fluorine atom at the 4-position, and the other group is a 4-(methylthio)phenyl ring, which has a methylthio group (-SCH3) attached at the 4-position. This molecule is known for its potential applications in the synthesis of pharmaceuticals and agrochemicals, as well as its use as an intermediate in the production of various organic compounds.

724-88-9

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724-88-9 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 724-88-9 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 7,2 and 4 respectively; the second part has 2 digits, 8 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 724-88:
(5*7)+(4*2)+(3*4)+(2*8)+(1*8)=79
79 % 10 = 9
So 724-88-9 is a valid CAS Registry Number.

724-88-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 20, 2017

Revision Date: Aug 20, 2017

1.Identification

1.1 GHS Product identifier

Product name 4-fluoro-4'-methylsulfanyl-benzophenone

1.2 Other means of identification

Product number -
Other names p-Thiomethyl-p'-fluorbenzophenon

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:724-88-9 SDS

724-88-9Relevant academic research and scientific papers

COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME

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Paragraph 0280, (2020/02/27)

An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.

4,5-Diaryl 3(2H)Furanones: Anti-inflammatory activity and influence on cancer growth

Semenok, Dmitrii,Medvedev, Jury,Giassafaki, Lefki-P.,Lavdas, Iason,Vizirianakis, Ioannis S.,Eleftheriou, Phaedra,Gavalas, Antonis,Petrou, Anthi,Geronikaki, Athina

supporting information, (2019/05/24)

Apart from their anti-inflammatory action, COX inhibitors have gathered the interest of many scientists due to their potential use for the treatment and prevention of cancer. It has been shown that cyclooxygenase inhibitors restrict cancer cell growth and are able to interact with known antitumor drugs, enhancing their in vitro and in vivo cytotoxicity. The permutation of hydrophilic and hydrophobic aryl groups in COX inhibitors leads to cardinal changes in the biological activity of the compounds. In the present study, thirteen heterocyclic coxib-like 4,5-diarylfuran-3(2H)-ones and their annelated derivatives-phenanthro[9,10-b]furan-3-ones-were synthesized and studied for anti-inflammatory and COX-1/2 inhibitory action and for their cytotoxic activity on the breast cancer (MCF-7) and squamous cell carcinoma (HSC-3) cell lines. The F-derivative of the -SOMe substituted furan-3(2H)-ones exhibited the best activity (COX-1 IC50 = 2.8 μM, anti-inflammatory activity (by carrageenan paw edema model) of 54% (dose 0.01 mmol/kg), and MCF-7 and HSC-3 cytotoxicity with IC50 values of 10 μM and 7.5 μM, respectively). A cytotoxic effect related to the COX-1 inhibitory action was observed and a synergistic effect with the anti-neoplastic drugs gefitinib and 5-fluorouracil was found. A phenanthrene derivative exhibited the best synergistic effect with gefitinib.

SULFONIUM SALT, PHOTOACID GENERATOR, COMPOSITION COMPRISING THE SAME, AND DEVICE MANUFACTURING METHOD

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Paragraph 0074-0075, (2018/03/31)

PROBLEM TO BE SOLVED: To provide a sulfonium salt suitably used for a photoacid generator realizing a photoresist having high sensitivity and enhancing acid generation efficiency. SOLUTION: The sulfonium salt is represented by the general formula (1) in the figure. SELECTED DRAWING: None COPYRIGHT: (C)2018,JPOandINPIT

Diarylmethylidenefuran derivatives, processes for their preparation and their uses in therapeutics

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, (2008/06/13)

The present invention relates to derivatives of the formula the process for their preparation, and to their uses in therapeutics, especially as drugs with anti-inflammatory, analgesic and chemopreventive properties.

Diarylmethylidenefuran derivatives and their uses in therapeutics

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, (2008/06/13)

The present invention relates to the derivatives of the formula STR1 and to their use in therapeutics, especially as drugs with anti-inflammatory and analgesic properties.

Carbocyclic diarylmethylene derivatives, processes for their preparation and their uses in therapeutics

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, (2008/06/13)

The present invention relates to the carbocyclic diarylmethylene derivatives of formula (I): STR1 and to their use in therapeutics, especially as drugs with anti-inflammatory and analgesic properties.

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