724-88-9Relevant articles and documents
COMPOSITION AND METHOD FOR MANUFACTURING DEVICE USING SAME
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Paragraph 0280, (2020/02/27)
An onium salt and a composition having high sensitivity and excellent pattern characteristics such as LWR, which is preferably used for a resist composition for a lithography process using two active energy rays of a first active energy ray such as an electron beam or an extreme ultraviolet and a second active energy ray such as UV.
SULFONIUM SALT, PHOTOACID GENERATOR, COMPOSITION COMPRISING THE SAME, AND DEVICE MANUFACTURING METHOD
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Paragraph 0074-0075, (2018/03/31)
PROBLEM TO BE SOLVED: To provide a sulfonium salt suitably used for a photoacid generator realizing a photoresist having high sensitivity and enhancing acid generation efficiency. SOLUTION: The sulfonium salt is represented by the general formula (1) in the figure. SELECTED DRAWING: None COPYRIGHT: (C)2018,JPOandINPIT
Diarylmethylidenefuran derivatives and their uses in therapeutics
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, (2008/06/13)
The present invention relates to the derivatives of the formula STR1 and to their use in therapeutics, especially as drugs with anti-inflammatory and analgesic properties.