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Phenol, 4,4'-cycloheptylidenebis- is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

73008-79-4

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73008-79-4 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 73008-79-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 7,3,0,0 and 8 respectively; the second part has 2 digits, 7 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 73008-79:
(7*7)+(6*3)+(5*0)+(4*0)+(3*8)+(2*7)+(1*9)=114
114 % 10 = 4
So 73008-79-4 is a valid CAS Registry Number.

73008-79-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 19, 2017

Revision Date: Aug 19, 2017

1.Identification

1.1 GHS Product identifier

Product name 4-[1-(4-hydroxyphenyl)cycloheptyl]phenol

1.2 Other means of identification

Product number -
Other names 4-(1-(4-hydroxyphenyl)cycloheptyl)phenol

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:73008-79-4 SDS

73008-79-4Relevant academic research and scientific papers

NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF

-

, (2010/04/25)

The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1-naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.

NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF

-

Page/Page column 18, (2008/12/04)

The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron.The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1- naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.

3,3-Diphenylpentane skeleton as a steroid skeleton substitute: Novel inhibitors of human 5α-reductase 1

Hosoda, Shinnosuke,Hashimoto, Yuichi

, p. 5414 - 5418 (2008/02/13)

We designed and synthesized novel type 1 5α-reductase inhibitors by using 3,3-diphenylpentane skeleton as a substitute for the usual steroid skeleton. 4-(3-(4-(N-Methylacetamido)phenyl)pentan-3-yl)phenyl dibenzylcarbamate (11k) is a competitive 5α-reductase inhibitor with the IC50 value of 0.84 μM.

New acrylic esters, derivatives of some diglycidyl ethers as main components of lacquer compositions

Podkoscielny,Bartnicki

, p. 35 - 41 (2007/10/03)

The synthesis of diacrylate and dimethylacrylate of diglicydyl ethers of bisphenols was studied. Glycidyl ethers were prepared in the reaction of bisphenols with epichlorohydrin in the two phase liquid system including aqueous and organic phase. Acrylic and methacrylic acid were used for the esterification of the diglycidyl ether.

Process for producing bisphenols

-

, (2008/06/13)

Bisphenols substantially free of by-products, are produced rapidly by reacting a phenol and a compound of the formulae: STR1 wherein R and R' are hydrogen, lower alkyl or aryl; X is lower alkoxy or the same as X'; Y is chlorine or the same as X; X' is aryloxy; Z is a 1,2- or 1,3-propylenedioxy (that may optionally carry hydroxy, lower alkyl or lower hydroxyalkyl substituents), or arylenedioxy radical; n is integer from three to nine; m is (n-1).

Halogenated bisphenol-Z and derivatives thereof

-

, (2008/06/13)

Resistance to high heat distortion is imparted to high molecular weight aromatic polycarbonate resins by controlling the degree to which particular diphenols are halogenated so that there are obtained either highly pure dihalogenated diphenols or predeter

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