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α-Methylphenacyl perfluorooctanoate is a complex organic compound with the chemical formula C17H11F13O3. It is a derivative of phenacyl peroxide, featuring a perfluorooctanoate group attached to the α-methylphenacyl moiety. α-Methylphenacyl perflurooctanoate is known for its unique properties, such as its high stability and low reactivity, which make it useful in various chemical reactions and applications. It is often employed as a reagent in the synthesis of other organic compounds, particularly in fluorination processes, due to its ability to transfer fluorine atoms efficiently. The compound's structure and properties also contribute to its potential use in the development of new materials with specific chemical and physical characteristics.

81559-39-9

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81559-39-9 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 81559-39-9 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 8,1,5,5 and 9 respectively; the second part has 2 digits, 3 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 81559-39:
(7*8)+(6*1)+(5*5)+(4*5)+(3*9)+(2*3)+(1*9)=149
149 % 10 = 9
So 81559-39-9 is a valid CAS Registry Number.

81559-39-9Downstream Products

81559-39-9Relevant academic research and scientific papers

Photolabile blocked surfactants and compositions containing the same

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, (2008/06/13)

Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials. Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.

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