85342-62-7

Usage

Uses

Used in Semiconductor Manufacturing:
HNT is used as a photoacid generator for forming patterned nanoparticles in the volumetric manufacturing of semiconductor devices. This allows for the creation of intricate and precise patterns necessary for advanced semiconductor production.
Used in Gas Permeation Regulation:
HNT is used as a photo-responsive pore reopening agent in zeolites, which facilitates the regulation of the gas permeation process. This application enables the control of gas flow through zeolite materials, making it useful in various industrial processes.
Used in Photo-Responsive Films:
HNT is used as a photoacid generator in the formation of UV-irradiated trimethylsilyl ultrathin cellulose-based films. The presence of HNT allows for the creation of films with tunable properties, making them suitable for various applications such as sensors, displays, and other optoelectronic devices.

Upstream product

• 81-84-5 1,8-Naphthalic anhydride 
• 358-23-6 trifluoromethylsulfonic anhydride 
• 7797-81-1 N-hydroxy-1,8-naphthalenedicarboximide 
• 421-83-0 trifluoromethane sulfonyl chloride 

Relevant academic research and scientific papers

Synthesis method of N-hydroxynaphthalimide trifluoromethanesulfonate

The invention relates to a synthesis method of N-hydroxylnaphthalimide trifluoromethanesulfonate, and belongs to the field of organic synthesis. The method comprises the following steps: (1) taking N-hydroxyl-1,8-naphthalimide and trifluoromethanesulfonyl chloride as raw materials, aromatic hydrocarbon as a solvent and an alkaline solution as a catalyst to carry out esterification reaction, and after the reaction is finished, extracting and concentrating to obtain an N-hydroxylnaphthalimide trifluoromethanesulfonate crude product; and (2) recrystallizing the N-hydroxylnaphthalimide trifluoromethanesulfonate crude product obtained in step (1) to obtain N-hydroxylnaphthalimide trifluoromethanesulfonate, wherein a mixed solution of methylbenzene and water is used as a recrystallization solvent in the recrystallization process. The synthesis method is high in efficiency and high in yield, and the prepared N-hydroxylnaphthalimide trifluoromethanesulfonate is high in purity.

PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY

Provided is a non-ionic photoacid generator (A) expressed by general formula (1). R1 and R2 each independently represents an alkyl group having 1-18 carbons or a fluoroalkyl group having 1-18 carbons, an alkenyl group having 2-18 carbons, an alkynyl group

PHOTOACID GENERATOR AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY

PROBLEM TO BE SOLVED: To provide a nonionic photoacid generator having high photosensitivity to i-line, excellent heat-resistant stability, high compatibility with a hydrophobic material, and excellent solubility in a resist solvent. SOLUTION: A nonionic photoacid generator (A) represented by formula (1) below is provided. In the formula (1), R1 and R2 represent a hydrocarbon group having 1 to 18 carbon atoms, which may have a substituent (where a part of or all of hydrogen atoms may be replaced by fluorine atoms), and R1 and R2 may be identical or different from each other; and Y is a group represented by formula (2). COPYRIGHT: (C)2015,JPO&INPIT