87188-51-0

Usage

Hazard

Moderately toxic by skin contact. A mild skin irritant.

InChI:InChI=1/C13H16O3/c1-5-10-6-8-11(9-7-10)15-12(14)16-13(2,3)4/h5-9H,1H2,2-4H3

Upstream product

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Relevant academic research and scientific papers

METHOD OF PRODUCING HYDROXYSTYRENE DERIVATIVE

PROBLEM TO BE SOLVED: To provide a method of producing hydroxystyrene compounds and their derivatives, simply in a high yield, by using relatively inexpensive and easily removable agents and relatively mild conditions. SOLUTION: A method of producing hydroxystyrene compounds comprises decarboxylating a hydroxycinnamic acid compound in a solvent containing at least one solvent having an amide bond in the presence of water and/or hydroxy-containing compound. A method of producing hydroxystyrene derivatives comprises reacting the hydroxystyrene compound with an acylating agent and/or a carbonic esterification agent. COPYRIGHT: (C)2015,JPOandINPIT

Positive resist composition

A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.

Process for preparing substituted styrenes

Substituted styrenes are synthesized by a simple, low temperature technique. A protected phenol styrene is reacted with an acid anhydride, dicarbonate, a halogen substituted alkyl, or an acid chloride in the presence of base to form a carbonyl substituted styrene. Unexpected yield decrease due to distillation is avoided because the product is sufficiently pure to be used without such distillation.

Method of producing styrene derivatives

A method of producing styrene derivatives expressed the general formula (2) by reacting a benzaldehyde derivative expressed by the general formula (1) with dibromomethane under the existence of zinc metal as well as an active chloride for producing various types of oxystyrene which are polymerized monomers as a photoresist material used in a high density integrated circuit process from easily available materials which also can easily be handled: (wherein R indicates a an alkyl group, alkoxyalkyl group, an alkylcarbonyl group, an alkoxycarbonyl group, a 5 or 6-atom heterocylclic groups, or an alkylsilyl group); (wherein R indicates any of the same substituents as those described above.)

Process for preparation of alkoxycarbonyloxystyrene

The present invention provides a process for the preparation of alkoxycarbonyloxystyrene comprising reacting acyloxystyrene with a strong base to yield a phenolate to which is added an alkoxycarbonylating agent in an organic solvent and a phase transfer c