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Usage

Uses

Used in Surfactant Industry:
1,1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-Heneicosafluorooctadecane is used as a surfactant for its ability to reduce surface tension and improve the wetting properties of liquids. Its high thermal stability and chemical resistance make it suitable for use in harsh environments and various industrial processes.
Used in Firefighting Foams:
In the firefighting industry, 1,1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-Heneicosafluorooctadecane is used as a component in fire-resistant foams. Its high thermal stability and resistance to chemical degradation contribute to the effectiveness of these foams in extinguishing fires, particularly in situations involving flammable liquids and extreme temperatures.
Used in Lubricants and Greases:
Due to its low surface tension and chemical resistance, 1,1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-Heneicosafluorooctadecane is used as an additive in lubricants and greases. It helps to improve the performance and longevity of these products by reducing friction, wear, and corrosion, particularly in applications involving high temperatures and harsh chemical environments.
Used in Coatings and Sealants:
1,1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-Heneicosafluorooctadecane is used in the formulation of coatings and sealants due to its high thermal stability, chemical resistance, and low surface tension. These properties make it suitable for use in applications requiring protection against extreme temperatures, corrosive chemicals, and environmental exposure.
Used in Electronics and Semiconductor Industry:
In the electronics and semiconductor industry, 1,1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-Heneicosafluorooctadecane is used as a cleaning agent and etchant due to its ability to dissolve a wide range of materials and its compatibility with various electronic components. Its high thermal stability and chemical resistance make it suitable for use in the manufacturing and maintenance of electronic devices and semiconductors.

Upstream product

• 129838-40-0 1,1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-henicosafluoro-12-iodooctadecane 
• 423-62-1 1-Iodo-perfluorodecane 
• 111-66-0 oct-1-ene 
• 307-43-7 perfluorodecylbromide 

Relevant academic research and scientific papers

Structure of the smectic B phase formed by linear and branched perfluoroalkyl-alkanes

The structure of the smectic B phase formed by perfluorodecylalkanes has been analyzed through the synthesis of three molecules and a careful investigation of their mesophases. Molecules with C8, C10 and a branched C11 alkyl chain were considered. The structure factor analysis of 001 reflexions is consistent with the picture of alternating electron rich and electron poor sublayers. A structural model with segregated perfluoroalkyl chains in the middle of the layer and disordered alkyl chains on each sides is proposed. This model is discussed in terms of space filling arguments: chain lengths, cross section compatibility in the layer and compactness. Infrared dichroic ratios of the CH2 and CF2 stretching modes confirm that perfluoroalkyl subunits are perpendicular to the SB layer while alkyl ones, in a quasi molten state, fill the remaining layer space.

(Me3Si)3SiH-mediated intermolecular radical perfluoroalkylation reactions of olefins in water

Figure presented. Perfluoroalkyl-substituted compounds are regarded as important components of fluorophors and for the introduction of fluorous tags into organic substrates. Their syntheses in organic solvents are achieved through different methods, among which, the addition of perfluoroalkyl radicals to unsaturated bonds represents a convenient choice. On the other hand, intermolecular radical reactions in water have attracted the attention of synthetic chemists as a strategic route to carbon-carbon bond formation reactions. In this paper we undertook the intermolecular addition of perfluoroalkyl radicals on electron rich alkenes and alkenes with electron withdrawing groups in water, mediated by silyl radicals, and obtained perfluoroalkyl-substituted compounds in fairly good yields. The radical triggering events employed consist of the thermal decomposition of an azo compound and the dioxygen initiation. Our results indicate that for intermolecular carbon-carbon bond formation reactions mediated by (Me 3Si)3SiH, the decomposition of the azo compound 1,1′-azobis(cyclohexanecarbonitrile) (ACCN) is the best radical initiator. We also found that water exerts a relevant solvent effect on the rates of perfluoroalkyl radical additions onto double bonds and the H atom abstraction from the silane. Our account provides a versatile and convenient method to achieve perfluoroalkylation reactions of alkenes in water to render perfluoroalkylated alkanes as key intermediates in the synthesis of fluorophors and other fluorinated materials. This is the first report where perfluoroalkyl-substituted alkanes are synthesized through intermolecular radical carbon-carbon bond formation reactions in water, mediated by silyl radicals.