934585-95-2Relevant articles and documents
Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography
Chang, Seung Wook,Ayothi, Ramakrishnan,Bratton, Daniel,Yang, Da,Felix, Nelson,Cao, Heidi B.,Deng, Hai,Ober, Christopher K.
, p. 1470 - 1474 (2006)
Extreme ultra violet (EUV) lithography is one of the most promising next generation lithographic techniques for the production of sub-50 nm feature sizes with applications in the semiconductor industry. Coupling this technique with molecular glass resists